Used EATON NOVA / AXCELIS NV 10-80 #9227038 for sale
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ID: 9227038
Implanter
Specifications:
System characteristic / Design specification (1978) / Performance specification (1982)
Energy / 10-60 keV / 5-80 keV
Beam current P,As
60-80 keV / 10 mA / 12.5 mA
40 keV / 10 mA / 10.0 mA
Sb 40-80 keV / 5 mA / 6.0 mA
B 40-80 keV / 5 mA / 4.0 mA
Throughput P,As
Up to 3E15, 3" / 300 / 235
100 mm / 200 / 350
125 mm / - / 175
1E16, 3" / 150 / 190
100 mm / 100 / 125
125 mm / 70 / 88
B up to 1E15, 3" / 300 / 330
100 mm / 200 / 230
125 mm / 150 / 165
1E16, 3" / 80 / 80
100 mm / 50 / 50
125 mm / 30 / 33
Doping uniformity:
1σ across wafer, 5" / 0.75 / 0.5
Doping reproducibility:
1σ wafer to wafer / 0.5 / 0.5
Ion mass range / 1-150 / 1-130
Ion mass resolution M/∆M fwhh / 65c / 75
Wafer cooling / 140°C @ 600W / 100°C @ 1200W
Facilities requirements:
Power: 30 kVA
Air: 100 PSI, 4 cfm
N2: 5 PSI, 0.14 cfm
H2O: 40 PSI, 5 gpm
Exhaust: 1000 cfm
2000 vintage.
EATON NOVA / AXCELIS NV 10-80 ion implanter and monitor is a powerful and reliable device designed for the implantation of ions into substrates. The device is capable of implanting broad ranges of ions, such as boron, arsenic, phosphorus, antimony, sulfur, and others. It is equipped with various components that provide precise control of the process and facilitate easy and accurate operation. AXCELIS NV 10-80 consists of three main parts: the wafer stage, the ion source, and the monitor. The wafer stage is used to control the position of the substrate during implantation, allowing precise and repeatable placement of the ions. The ion source, comprised of magnetron cathode and electron guns, is used to generate and accelerate the ions towards the substrates. The monitor, comprised of solid-state detectors, measures the flux of the ions during the implantation process. EATON NOVA NV 1080 operates using a computer-controlled system that automates the implantation process. It can control many parameters, such as ion types, ion energies, ion strike rates, dose levels, and wafer positioning. This ensures precise implantation results and allows users to optimize implantation efficiency and accuracy. It is also equipped with safety features, including interlocks and limits on power levels . NV 1080 is designed for use in a wide range of applications, including in semiconductor manufacturing, MEMS, LED, optoelectronic, and biomedical treatments. It is compatible with various materials, including silicon, aluminum, zinc, tellurium, and titanium, and with a wide range of implantation angles. EATON NOVA NV 10-80 is a reliable and powerful device that provides excellent implantation results. Its automated computer-controlled system ensures precise and accurate implantation, and its range of features allows users to optimize implantation efficiency and accuracy. It is suitable for a wide variety of applications and substrate materials, making it a versatile and highly suitable device for ion implantation.
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