Used EATON NOVA / AXCELIS NV 3206 #9105737 for sale

EATON NOVA / AXCELIS NV 3206 Ion Implanter and Monitor is a medium-capacity equipment designed for high-precision ion implantation and semiconductor device fabrication. It features a Tandem Mass Analyzer, a patented "three-window" technology that ensures implant accuracy and repeatability from substrate to substrate. The monitor offers a wide range of implantation rates, with up to four beams that can work simultaneously for high-precision placement of any type of implantable material. AXCELIS NV 3206 is ideal for the fabrication of semiconductor elements, including electronic and photonic devices, as well as for microelectromechanical systems (MEMS). It is equipped with a 1,000-ampere-per-centimeter-squared beam current rating and an implanter dose rate capability of up to 90 microamperes per centimeter square with a mass precision of less than 1 part per million. The device's computer-controlled user interface allows for precise user-defined implant programs that include implantation parameters such as dose, energy, frequency, and spot size. The system also includes an ion beam extraction unit designed to minimize background particle counts and to provide the highest possible repeatability in various implantation runs. Featuring high-precision beam shifts, the monitor allows a wide range of energy and current combinations in order to enable high-precision ion implantation operations. In addition, the machine's high-bandwidth E-field control features a choice of two optimized E-field profiles and a variable polarity mode for substrate grading. EATON NOVA NV 3206 is a reliable and versatile tool for optimizing the performance of both production and prototype implantation. Its ion source design reduces downtime and improves overall production yields. It also features an inertially stabilized beam transport asset that ensures beam purity and enhances the device's imaging properties. And with its built-in monitoring and diagnostic features, the monitor allows for quick and accurate feedback and analysis of implantation operations.