Used EATON NOVA / AXCELIS NV 6200 #9013661 for sale

AXCELIS 6200 is an ion implanter and monitor designed for implanting dopants onto semiconductor substrates during the semiconductor manufacturing process. This equipment performs ion implantation at a maximum dose rate of 1.5 x 10^7 cm-2 sec-1 and can be used to implant a wide range of materials, including boron, arsenic, phosphorous, aluminum, and other materials. EATON NOVA 6200 is equipped with a computerized control device which allows for precise control of all parameters and settings and enables a comprehensive performance monitoring system. EATON NOVA / AXCELIS 6200 consists of two interconnected units - an ion source and an accelerator. The ion source is responsible for creating ions of the desired species and can be configured to create either positively-charged or negatively-charged ions. The accelerator is used to increase the ions' energy so that they can penetrate deeply into the substrate during implantation. This accelerator utilizes an electromagnetic field to increase the ions' velocity. AXCELIS 6200 is capable of implantation of both shallow (less than 1 micron) and deep (greater than 1 micron) implants into substrates with a maximum dose of 5E15 atoms cm-2. It is also equipped with an integrated cooling unit to ensure long lifetime operation. This machine is capable of handling wafers up to 200 mm in diameter with a 50 millisecond cycle time. It has an accurate dose uniformity measurement of +/- 0.5 %. EATON NOVA 6200 is also designed for data communication, allowing it to be connected to the customer's network. The tool is compatible with Windows, Macintosh, and Unix Operating Systems and can also be monitored remotely. The user is able to access all available parameters and settings, allowing complete control of the implantation process. This asset also offers a graphical user interface, providing comprehensive monitoring and reports. EATON NOVA / AXCELIS 6200 is an excellent tool for applications such as shallow/deep implantation, contact holes, and implants on small wafers. This model is user-friendly and can be easily integrated into the customer's existing semiconductor fabrication production line.