Used EATON NOVA / AXCELIS NV 6200A #293628042 for sale
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ID: 293628042
Wafer Size: 6"
Vintage: 1990
Implanter, 6"
Energy: 5 to 200 kV
Accel PS: 180 kV
Extraction: 20 kV
Neutral gas: Argon
Hot source with oven
(3) Gas box lines with mass flow
(2) External gas box lines
Extraction housing
Magnet range: 125 Standard voltage
Dose uniformity and repeatability: 1 σ < 0.5%
Type: Dual platen, continuous through put, cassette to cassette
Fully automatic, pick and place
Throughput: 250/hr
Wafer tilting: 0 To 10°
Wafer orientation: 0 To 360°
Wafer breakage: Less 1 wafer out of 20000
Cooling water: 3 GPM with 80°F
Input temperature: 30 - 60 PSI
Compressed air supply: 90 - 125 PSI
Dry nitrogen: 60 - 70 PSI
Heat dissipation:
Air: 16750 BTU/hr
Water: 49000 BTU/hr
Exhaust air volume:
Gas box: 300 CFM (minimum)
H.V Terminal: 300 CFM (minimum)
Power: 24 kVA, 208 V, 3 Phase, 5 Wire, 50/60 Hz
1990 vintage.
EATON NOVA / AXCELIS NV 6200A is an advanced Ion Implanter and Monitor that was created in order to provide highly accurate, precise, and reliable processing of Ion Implantation. This enables the user to have maximum fabrication performance regardless of ion species, dose, and energy range. AXCELIS NV 6200A is one of the premier pieces of equipment within the field of Ion Implantation. The design of EATON NOVA NV-6200A plays a large part in its success. This machine features a heated, self-cleaning, quartz vacuum equipment and is tailored for inert gas and diode technologies. Its ultra-high vacuum (UHV) version is ideal for ultra-low energy hydrocarbon ions. This machine also makes use of proprietary Radial Field Technology that enables highly uniform, multi-point implantation profiles to be achieved. Additionally, EATON NOVA / AXCELIS NV-6200A is built to accommodate a range of semiconductor processes which allow for greater flexibility in complex implantation runs. AXCELIS NV-6200A also features an integrated monitor that allows for closed-loop feedback and control. This system enables the user to monitor particle beam current, pressure, and gas flow for real-time adjustment and correction. Additionally, the monitor can also diagnose various unit conditions and allow for preventive maintenance in order to provide reliable operation down to the nanometer level. Through this, the user can ensure that process conditions are maintained in tip-top shape which makes the Nuclear Resonance analysis possible. Overall, NV 6200A is a powerful and reliable piece of equipment that can handle the most intricate and advanced semiconductor processing requirements. It allows the user to achieve highly accurate and precise implantation processes using a range of ion species, doses, and energies. By utilizing Radial Field Technology as well as an integrated monitoring machine, this machine helps to ensure that fabrication performance is maximized and that any number of processes are completed successfully.
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