Used EATON NOVA / AXCELIS NV 6200A #9272603 for sale
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ID: 9272603
Wafer Size: 6"
Medium current implanter, 6"
Energy: 200 KeV
CPU: Pentium-MMX
Source vacuum pump: Dry
Beam-line vacuum pump: Dry
End station vac pump: Dry
End station: Enhanced
Cryo pump.
EATON NOVA / AXCELIS NV 6200A is an advanced ion implanter and monitor equipment designed for high-precision ion implantation. The included ion source is capable of producing a wide range of doses and energies, making it ideal for precise doping of silicon substrates and other materials. The software and hardware of the system provides the user with precise control over the ion implantation process, allowing for both high accuracy and repeatability. The unit comes with a wide variety of features, including a user-friendly interface that allows users to easily setup and monitor their process. It also allows the user to adjust the parameters of the implant, such as the beam shape, beam size, and dose. Additionally, the unit includes features for monitoring the process such as a beam current monitor, accumulated dose monitor, and process status monitor. AXCELIS NV 6200A has a low-vacuum deposition chamber that is ideal for controlled implanting and provides excellent optical access. The machine can also be configured with a range of silicon pre-coating options, including Oxide coatings, organometallic coatings, and photo resist coatings. This allows a variety of silicon substrates to be used for ion implantation. For users with demanding processes the tool also includes a range of advanced features, such as fully automated pulsed implants and multiple implant combinations. These features provide users with greater control and accuracy over their process. To make sure the asset is always running at optimal efficiency, it includes a number of additional features to minimize contamination and improve process performance. These features include cleanroom compatible fabrication, an automated wafer-handling model, and an array of integrated sensors to monitor the chamber atmosphere. The sensors continuously monitor and alert users to any changes in the process, ensuring that the equipment runs as efficiently as possible. EATON NOVA NV-6200A is a powerful and accurate ion implanter and monitor system that provides users with the accuracy and control they need. The unit's precision and reliability makes it ideal for producing high-quality, repeatable results for a variety of implantation applications. Plus, it includes advanced features and sensors that ensure easy setup, monitoring, and accurate operation.
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