Used EATON NOVA / AXCELIS NV 6200AV-MD #293829792 for sale

ID: 293829792
Wafer Size: 6"
Medium current ion implanter, 6" Cassete Standard specific layout Burned source Source analyzer magnet Scanning system-single wafer Beam energy configuration: Beam energy: 0 ~ 180 keV Extraction mode: 0 ~ 20 keV Acceleration mode: 20 ~ 180 keV Vacuum pump system: Diff pump: VHS6 Cryo pump (beam line and chamber): CTI-8 Wet pump: ETM40, ET18, RV8, EH-250 Cryo compressor: CTI9600 Gas / Model / MFC Type PH3 / MFC / SDS BF3 / MFC / Standard Ar / MFC / Standard.
EATON NOVA / AXCELIS NV 6200AV-MD is an advanced ion implanter and monitor that is designed to meet the demanding requirements of the semiconductor industry. This cutting-edge equipment combines precision, efficiency, and flexibility to deliver high-quality ion implantation processes for the fabrication of semiconductor devices. At the heart of AXCELIS NV 6200AV-MD is its ion source, which generates a beam of ions that can be precisely controlled and directed towards the target substrate. The system is capable of implanting a wide range of ion species, including boron, arsenic, phosphorus, and others, enabling the creation of dopant profiles with high precision and accuracy. One of the key features of EATON NOVA NV 6200AV-MD is its advanced beamline unit, which includes precision optics and beam steering components that allow for accurate ion beam placement on the target surface. This level of control is essential for achieving the desired doping profiles and device characteristics in semiconductor manufacturing. The machine is equipped with a range of implantation energy options, allowing users to tailor the ion beam to the specific requirements of their process. Whether performing shallow or deep implants, NV 6200AV-MD provides the flexibility needed to optimize device performance and yield. In addition to its ion implantation capabilities, EATON NOVA / AXCELIS NV 6200AV-MD also features comprehensive monitoring and control systems to ensure process stability and repeatability. Real-time beam current monitoring, energy control, and beam profile monitoring are just a few of the tools available to operators to maintain tight process control and achieve high-quality results. The tool is designed with ease of use in mind, featuring an intuitive user interface that allows operators to program implantation recipes, monitor process parameters, and analyze data with ease. This user-friendly approach streamlines the implantation process and reduces the risk of errors, ultimately improving productivity and time to market for semiconductor manufacturers. Furthermore, AXCELIS NV 6200AV-MD is built with reliability and uptime in mind, with robust construction and advanced diagnostic capabilities to minimize downtime and maximize asset availability. Regular maintenance and service routines are supported by the model's monitoring and diagnostic features, ensuring that the equipment operates at peak efficiency with minimal interruptions. Overall, EATON NOVA NV 6200AV-MD sets a new standard for ion implantation technology in the semiconductor industry, offering unparalleled performance, flexibility, and reliability for a wide range of implantation processes. With its advanced features and user-friendly design, this system is poised to drive innovation and excellence in semiconductor manufacturing for years to come.
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