Used EATON NOVA / AXCELIS NV 6200AV #293632893 for sale

EATON NOVA / AXCELIS NV 6200AV
ID: 293632893
Medium current implanter.
AXCELIS/Axccelis EATON NOVA / AXCELIS NV 6200AV is a human-machine interface (HMI) ion implanter and monitor designed to simultaneously and accurately implant ion beams into semiconductor substrates. It offers high production rates and lower costs due to its ultra-high productivity, reduced cycle times, and automated vacuum technology. AXCELIS NV 6200AV utilizes cooled ion sources, efficient beam transport systems, and advanced plasma generation technology. This provides improved throughput and uniform ion beam profiles, so that more consistent and higher-quality implants can be achieved. Additionally, EATON NOVA NV 6200 AV offers superior accuracy and control capabilities and is capable of providing quantitative implant results with tight process control in a cost-effective package. EATON NOVA/Axccelis EATON NOVA NV 6200AV is designed with two operating modes to suit any process requirements. The AutoMode establishes a steady-state regimen utilizing automatic and semi-automatic parameters and operation, while the ManualMode allows a user to adjust parameters such as current, beam profile, and energy without disrupting the overall process. This flexibility makes it possible to design implants that are tailored specifically to a particular application. EATON NOVA / AXCELIS/Axccelis EATON NOVA / AXCELIS NV 6200 AV plasma generator is capable of generating fresh plasma with a single rotation of the electron gun. The unique design of AXCELIS NV 6200 AV ensures that the quality of the plasma is the same in every rotation, creating implants that are of the highest quality. Additionally, all process parameters can be set by the user and the ion implanter is designed to calculate all implant parameters. AXCELIS/Axccelis NV 6200AV also features detailed monitoring, which can significantly increase productivity by decreasing tool downtime and increasing throughput. Real-time beam current and profile monitoring allows for continuous analysis and control of the implant process. As a result, user-definable profiles of implantation are easily achievable. In addition, a variety of custom diagnostics are available for easy monitoring of the ion implanter's performance. EATON NOVA/Axccelis NV 6200 AV is a powerful and sophisticated ion implanter and monitor that offers manufacturers the best way to consistently and accurately implant ion beams into semiconductor substrates. Its advanced cooling system and reliable process controls ensure that it can consistently and accurately produce implants that meet a user's exact specifications. It also offers precision monitoring capabilities to maximize productivity and reduce tool downtime.
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