Used EATON NOVA / AXCELIS NV 6200AV #9411903 for sale
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ID: 9411903
Wafer Size: 6"
Vintage: 2007
Medium current implanter, 6"
NESLAB Chiller
Chemicals: Phosphine, Arsine, Boron Triflouride dopants
PC Control system
Beam energies: 10-190 KeV
2007 vintage.
EATON NOVA / AXCELIS NV 6200AV is a advanced Ionomer Implanter and Monitor designed for the production of advanced integrated circuits and other high precision advanced materials. This machine is capable of implanting ions into a substrate at high current densities, resulting in precise doping and low gas release which precludes particle traps. The implanter uses a series of 25 high-voltage cells that are arranged in an inverted star configuration which allow for the precise movement and control of the ions. The implanter also houses an electron-beam diagnostic system, allowing for real-time decisions on the performance of the implanter. This tool has been designed with precision and accuracy in mind. The NovaAXCELIS NV 6200AV has a state-of-the-art active monitor which offers peak ion current along with implantation doses, dose distributions, scan range and granularity, while providing feedback data on the optimum implantation conditions. This control panel offers a variety of power functions, including power supply stabilization, rapid voltage ramping and beam stability. This allows for precise ion implantation within a non-critical process window, reducing particle contamination and improving the mechanical stability of the chips. The implanter also features a high-current, multi-segmented load coil assembly. This allows for precise operation for each ion species, producing homogeneous ion flux areas even with high current concentrations. The precise control of the ions ensures precise implants that produce the required dopant concentrations in each layer. The implanter also has a built-in beam-focusing system that adjusts with the implantation conditions to ensure best possible projections. EATON NOVA NV 6200 AV is a reliable, highly advanced Ionomer Implanter and Monitor. It ensures precise and homogeneous ion implantation and has an unprecedented powerful real-time monitor which allows for consistent results. This tool is a must for any high precision IC fabrication and advanced materials manufacturing process.
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