Used EATON NOVA / AXCELIS NV 8200 #9409485 for sale
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EATON NOVA / AXCELIS NV 8200 is a next generation, multi-purpose ion implanter & monitor equipment designed for the most demanding semiconductor processing applications. It is capable of providing superior ion implantation performance, as well as highly accurate and reliable monitoring capabilities. At the heart of the NovaAXCELIS NV 8200 system is a large area perforated ion source (LAPIS), providing superior ion implantation performance. The LAPIS allows for high throughput and uniform dose over large areas. It also provides improved control of spatial uniformity and allows for optimized process control. The unit also features a high resolution, high accuracy full-field deflector control machine, allowing the beam to be accurately steered, while minimizing the impact of deflection on overall beam uniformity. This tool provides improved control of spatial uniformity, and optimizes the dose distribution throughout the implant process. The NovaEATON NOVA NV 8200 also features a high precision, monochromator-type ion monitor, which offers superior stability and accuracy. This allows for precise control of the implant process and provides a high level of dose uniformity and control. In addition, the asset is equipped with a closed-loop, temperature controlled vacuum chamber, which provides superior operating conditions and maintains the beam uniformity. The chamber is highly insulated against changes in ambient temperature, thereby minimizing changes in beam characteristics. In addition, the model includes several other features such as a high performance, electrically actuated height adjuster, which allows for fast and accurate adjustment of the source height, and a field-adjustable beamline manipulator, which permits quick and accurate adjustment of the beam angle and/or angle of incidence. Overall, NV 8200 is a superior, multi-purpose ion implanter & monitor equipment designed to provide superior performance and reliable monitoring capabilities. Its features make it an ideal choice for demanding semiconductor processing applications.
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