Used EATON NOVA / AXCELIS NV 8200P #293587241 for sale

EATON NOVA / AXCELIS NV 8200P is an advanced ion implanter and monitor used in semiconductor manufacturing operations. It features a high-precision, DC-based implanting equipment with multiple integrated sensors and monitors that enable accurate and repeatable ion implantation. With a wide range of implant parameters and ability to set process rules, the system is designed to provide superior results in a cost-effective manner. The unit features an advanced multi-duty source with a 0-90 kV accelerating voltage range and up to 350 mA of current, allowing it to implant both light ions such as boron, phosphorous, and arsenic, and heavy ions such as gallium, titanium, and indium. To provide accurate results, it is equipped with a series of in-situ monitors and sensors, including a broad scanning channel for measuring time-dependent profiles of implant distribution and dose rate, as well as a temperature sensing probe for process stabilization. AXCELIS NV-8200P also includes a complete range of automation and control features, allowing fine-tuning and optimization of process parameters. For example, it can set and monitor process limits, adjust the beam rigidity and energies, and compensate beam wobble and non-linearities. It can also quickly measure the critical dose rate, as well as detect and correct bias errors. The control machine also features an intuitive, one-touch user interface that provides an array of information, including current process conditions and energy levels, tool status, and recipes to be executed. Furthermore, the asset includes complete process optimization tools for reducing cycle time and improving product yields, as well as a complete suite of maintenance and diagnostic tools for troubleshooting issues. Overall, EATON NOVA NV 8200 P is an advanced and versatile ion implanter and monitor designed to deliver accurate, repeatable results while providing robust process control. It comes with an intuitive user interface and complete automation and control features which make it ideal for semiconductor fabrication applications.