Used EATON NOVA / AXCELIS NV 8200P #293646149 for sale

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ID: 293646149
Wafer Size: 6"
Ion implanter, 6" Transformer Injector: Bernase ion source with dual vaporizer Single stage extraction, 15-40 kV Dipole magnet, 90° Target postioning / scanning system: Parallel beam Electrostatic angle correction Programmable tilt, 0°-60° Endstation: Electrostatic silicon wafer chuck, 6" Flat / notch alignment with buffer cassette 3-Axis robotic pick and place system Vacuum system: LEYBOLD HERAEUS TMP 1000C LEYBOLD HERAEUS TMP 600C LEYBOLD HERAEUS TMP 151C CTI-CRYOGENICS Cryo-Torr, 8" (3) Turbo controllers Roughing pump: LEYBOLD HERAEUS D40B Rotary vane LEYBOLD HERAEUS D40BCS EDWARDS iQDP40 Dry pump EDWARDS EH250 Blower Gas bottle enclosure: MFC VCR Fittings Does not include: Chillers, Helium compressor.
EATON NOVA / AXCELIS NV 8200P is an advanced ion implanter and monitor equipment used in the microelectronics manufacturing industry. This system is designed to create very accurate and precise device structures, which are critical for today's increasingly complex electronic components. AXCELIS NV-8200P ion implanter is built on an expandable platform designed to accommodate higher process throughput and increased accuracy. It incorporates the latest technologies in beamline technology to achieve low-loss etching and uniform implant distribution. The simplified beamline design also helps to reduce downtime and increase longevity of the unit. EATON NOVA NV 8200 P is capable of implant angle and depth control that provides greater flexibility and accuracy in the implantation process. It can be used to implant a variety of materials as well as different dose levels. It also provides a range of process parameters such as beam current, ion energies, acceleration voltages and directions, making it one of the most flexible implanter systems available. EATON NOVA NV 8200P monitor provides real-time feedback to the user with the use of its in-situ beam extraction mechanism. The machine measures the deposition rate, ion range, reflected thickness, beam current and energy of the implant giving the user greater control over the process. It can also detect critical events which helps prevent product damage during implantation. AXCELIS NV 8200P is a leading ion implanter and monitor tool that offers unparalleled accuracy and repeatability in the creation of device structures for the microelectronics industry. Its advanced features and robust design make it an ideal choice for those looking to create high-quality products with even higher-quality control.
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