Used EATON NOVA / AXCELIS NV 8200P #9402498 for sale

EATON NOVA / AXCELIS NV 8200P is a state-of-the-art ion implanter and monitor. This particular ion implanter and monitor is used to implant ions into a semiconductor substrate which can then be used to modify and improve the electrical characteristics of the semiconductor material. As the name implies, the NOVAAXCELIS NV-8200P is powered by a high-end, high-performance AXCELIS ion source. The Nova ion source is designed to be very efficient and is capable of generating high beam currents and fluences while minimizing waste through the application of advanced ion beam optimization techniques. EATON NOVA NV 8200 P also has an advanced monitor system that includes an integrated real-time beam monitor, particle distribution monitor, and energy dispersive spectrometer. This combination of instruments allows precise control over the beam composition and characteristics, thereby enabling precise tuning and optimization of the ion implant. The NOVAAXCELIS NV 8200 P is equipped with a wide range of process capabilities. It's capable of producing and controlling boron, phosphorus and arsenic implants as well as nitrogen and oxygen implants. It is also capable of producing a wide range of implants from shallow to junction and depths. Furthermore, it is capable of executing a variety of pulse shapes such as square wave and triangular waveforms, enabling the implantation of a wide range of doses into the target semiconductor substrate. In addition to the NOVAAXCELIS NV 8200P's implanting and monitoring capabilities, the system also includes integrated alignment tools that can help ensure precise calibration of the system as well as optimized scan alignment which is key to achieving high implant yields. EATON NOVA NV-8200P is a highly sophisticated and innovative ion implanter and monitor. Its combination of advanced ion source, processes, monitors, and alignment tools make it a powerful tool for ion implantation, allowing precise control and optimization of implant parameters while minimizing waste. This highly versatile and powerful ion implanter and monitor is an essential tool for many applications including premium device fabrication and semiconductor research.