Used EATON NOVA / AXCELIS NV 8250 #293595676 for sale
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ID: 293595676
Vintage: 2000
Implanter
Vacuum system:
CTI-CRYOGENIC 9600 Cryo compressor
OB 8 Beam line cryo pump
(2) OB 8 Process cryo pumps
STP1003C Source pump
STP301C Beam line turbo pump
STP1003C Beam line turbo pump
Vacuum controller: HCIG
End-station:
(2) Cassettes capability
Wafer size: 8"
Wafer notch alignment: Automatic notch alignment capability
Wafer handling system: In-air / In-vacuum high throughput
Particle filter system: Class 1, UPLA Filtered wafer handling system
Implant angle capability:
Quad implant
Real-time beam profiler (Single dimension)
Tilt axis: 45°
Twist axis: 360°
Beam monitoring system: Real-time patented dose control
Chuck: Electro-static clamp
Chuck cooling interlock
ASYST LPT 2200 SMIF Interface
Chiller
E-Clamp
E-Shower controller and power supply unit
Flag faraday relay box
Beam profiler card include external box
DSP Motor controller
CP1 Pump
Dosimetry frame include side cup and P-Cup
Cell controller
Aligner assembly
CPU
Tx Arm include pneumatic assy
Oscilloscope
FFU
Terminal:
Four string gas box:
Gas box option: Modular gas box
High pressure string
(2) SDS String hydride: Arsine and phosphine
SDS String fluoride: Boron trifluoride
(3) Pressure transducer on SDS string (Per string): PSIA
Mass flow controller:
UNIT 1660
(3) UNIT 1662
Extraction voltage monitor: 0-40 keV
Vaporiser:
Ion source: ETERNA Extended Life Source (ELS)
Source bushing: Extended life bushing
Extraction electrode: (3) Axis extraction electrode
AMU System: Triple indexed mass analysis magnet and power supply
Beam shutter
Beam line quads beam focus and scanner
P-Lens power supply: 0-68 keV
Decel power supply: 0-40 keV
Accel power supply: 0-142 keV
Terminal transformer: Oil-cooled transformer
Angular energy filter
Energy slit
Beam profiler with P-cup
Flag faraday with side cups
Cathode power supply unit
Filament power supply unit
Arc power supply unit
Source controller
(3) Turbo pump include controller / Harness
Ext electrode assy
Source and cooling flange
Source magnet power supply unit
High resolution scanner scan generator DI
AMU Power supply unit
Terminal PD DI
Beam Shutter DI: Dose DI
Terminal beam line DI: General IO DI
Gas box DI
Ground interface DI: Terminal DI
Disk thermocouple DI: TC Di
(4) IG Controllers and cables
HV Supply power supply unit
Extraction power supply unit
Quad power supply unit
Right scan amplifier
Digital tesla meter
Scan suppression power supply unit
Accel power supply unit
Decel power supply unit
AEF power supply unit
Charge control technology: E-Shower
NESLAB / AFFINITY Chiller
Control UPS:
Main isolation transformer
Smoke detector
Exhaust flow switch
Water leakage sensor
Light tower
SECS I and SECS II Protocols
GEM Interface
Ethernet ports
IG and TC Gauge
2000 vintage.
EATON NOVA / AXCELIS NV 8250 is a powerful ion implanter and monitor designed to facilitate high-precision and high-quality ion implantation processes. The equipment has a sophisticated design that delivers excellent accuracy, repeatability and robustness. The ion implanter is engineered with two sets of concentric columns. The outer set of columns are known as the source chamber and the inner set of columns are called the target chamber. The source chamber houses the ion source and the target chamber houses the specimens to be implanted. Additionally, the system also features a computer-controlled beamline, which provides precise control over the ion implantation process. The efficient and reliable ion implanter is equipped with a wide range of features that improve accuracy and productivity. The unit is capable of automating all the essential operations in the ion implantation process, including the source chamber and target chamber parameters, emittance and beam scanning. Additionally, the machine also has a sophisticated error detection mechanism, which can detect issues before they cause errors in the implantation process. AXCELIS NV 8250 also features advanced diagnostic methods that ensure the stability of the tool in terms of energy stability and beam parameter accuracy. The asset is especially useful for making implants with high precision, repeatability and robustness. It also has a user-friendly interface that allows users to easily monitor and control the ion implantation process. Lastly, EATON NOVA NV 8250 is designed for long-term, reliable operation and offers a range of benefits such as enhanced implant quality, improved throughput and reduced cycle times. This makes it a great choice for users that require high-quality ion implanters and monitors for their applications.
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