Used EATON NOVA / AXCELIS NV 8250 #9361406 for sale

EATON NOVA / AXCELIS NV 8250 is a state-of-the-art ion implanter and monitor specifically designed for use in semiconductor fabrication. This advanced implanter utilizes direct current (DC) or pulsed DC ion sources to provide precise ion beam control, precision deposition, and high through-put for modern, commercially-available semiconductor substrates. The 8250 features a high-resolution resistive optical scanner, mounted directly on the implanter, to accurately monitor and control the ion beam current. The scanner also helps to ensure excellent profile control by using an automatic dose metering equipment and knowledge-based monochromatic imaging. By providing real-time information on ion implant depth and system performance, users can be assured of high-performance ion implant profiles and uniformity in all process cycles. The 8250 implanter incorporates a high-flux, low drift source and ion source design. This ensures highly uniform energy distribution with a near-zero background, resulting in excellent profile control and repeatability during deposition. The source is capable of operating across a wide range of ion implant energies, from 50 eV to 250 keV. The ion source also supports an additional multi-target array to support specialized Ionization techniques. In addition, the 8250 implanter offers a wide array of temperature control and process monitoring. It features temperature-controlled cook chambers, evaporator ovens, and a high-precision temperature control unit. This ensures that all parameters in the deposition process are maintained within required ranges, and maximizes substrate yield when producing high-quality semiconductor wafers. The 8250 machine also includes sophisticated software with an intuitive user interface. This allows engineers to easily program the implanter for their specific application requirements, as well as track tool performance. Real-time feedback on implant depth, energy, and other parameters can also be accessed from the asset software. This advanced ion implanter and monitor has been designed to provide an efficient, reliable solution for the production of high-performance semiconductor wafers. From its high-flux, low-drift source design to its unique temperature control and process monitoring, AXCELIS NV 8250 is an ideal choice for the state-of-the-art fabrication of microdevices.