Used EATON NOVA / AXCELIS NV 8250HT #9366390 for sale
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ID: 9366390
Vintage: 2000
Implanter
Vacuum system:
CTI-CRYOGENIC 9600 Cryo compressor
OB 8 Beam line cryo pump
(2) OB 8 Process cryo pumps
STP1003C Source pump
STP301C Beam line turbo pump
STP1003C Beam line turbo pump
Vacuum controller: HCIG
End-station:
Cassette capability: 2-Cassette
Wafer size: 8"
Wafer notch alignment: Automatic notch alignment capability
Wafer handling system: In-air / In-vacuum high throughput
Particle filter system: Class 1, UPLA Filtered wafer handling system
Implant angle capability:
Quad implant
Real-time beam profiler (Single dimension)
Tilt axis: 45°
Twist axis: 360°
Beam monitoring system: Real-time patented dose control
Chuck: Electro-static clamp
Chuck cooling interlock
ASYST LPT 2200 SMIF Interface
Chiller
E-Clamp
E-Shower controller and power supply unit
Flag faraday relay box
Beam profiler card include external box
DSP Motor controller
CP1 Pump
Dosimetry frame include side cup and P-Cup
Cell controller
Aligner assembly
CPU
Tx Arm include pneumatic assy
Oscilloscope
FFU
Terminal:
Four string gas box:
Gas box option: Modular gas box
High pressure string
(2) SDS String hydride: Arsine and phosphine
SDS String fluoride: Boron trifluoride
(3) Pressure transducer on SDS string (Per string): PSIA
Mass flow controller:
UNIT 1660
(3) UNIT 1662
Extraction voltage monitor: 0-40 keV
Vaporiser
Ion source: ETERNA Extended Life Source (ELS)
Source bushing: Extended life bushing
Extraction electrode: (3) Axis extraction electrode
AMU System: Triple indexed mass analysis magnet and power supply
Beam shutter
Beam line quads beam focus and scanner
P-Lens power supply: 0-68 keV
Decel power supply: 0-40 keV
Accel power supply: 0-142 keV
Terminal transformer: Oil-cooled transformer
Angular energy filter
Energy slit
Beam profiler with P-cup
Flag faraday with side cups
Cathode power supply unit
Filament power supply unit
Arc power supply unit
Source controller
(3) Turbo pump include controller / Harness
Ext electrode assy
Source and cooling flange
Source magnet power supply unit
High resolution scanner scan generator DI
AMU Power supply unit
Terminal PD DI
Beam Shutter DI: Dose DI
Terminal beam line DI: General IO DI
Gas box DI
Ground interface DI: Terminal DI
Disk thermocouple DI: TC Di
(4) IG Controllers and cables
HV Supply power supply unit
Extraction power supply unit
Quad power supply unit
Right scan amplifier
Digital tesla meter
Scan suppression power supply unit
Accel power supply unit
Decel power supply unit
AEF power supply unit
Charge control technology: E-Shower
NESLAB / AFFINITY Chiller
Control UPS
Main isolation transformer
Smoke detector
Exhaust flow switch
Water leakage sensor
Light tower
SECS I and SECS II Protocols
GEM Interface
Ethernet ports
IG and TC Gauge
2000 vintage.
EATON NOVA / AXCELIS NV 8250HT is an ion implanter used in semiconductor manufacturing processes. This tool is a high-energy, high-throughput, medium-diameter ion implanter. It is used to implant various types of ions into material substrates for the fabrication of electrical or electronic components. AXCELIS NV 8250HT is equipped with a high-performance, 30 keV GaAs-enhanced screen which allows for focused implant profiles, enhanced substrate throughput, and improved process reliability. An integrated, high-resolution optical sensor is used to monitor the ion beam to provide accurate implant monitoring. EATON NOVA NV 8250 HT features an advanced IntelliActivityTM Chamber Control Equipment which enables precise beam manipulation and ion beam control. This precise ion beam control allows for both the implantation and the control of a wide range of ion species, including both boron and phosphorous. Additionally, NV 8250HT is equipped with seven interchangeable target positions to precise implantation methods for varying materials. The chambers can also be used to increase the uniformity of ion implantation. EATON NOVA NV 8250HT utilizes a six-stage DC-magnetic beam transport system and a 50kV pre-acceleration stage. It features an integrated, high-voltage, low-current beam scoring unit which provides precise control of the ion beam. EATON NOVA / AXCELIS NV 8250 HT also features an advanced closed-loop ion current monitoring machine with an adaptive feedback loop which adjusts the ion current levels in order to accommodate varying substrates and implant conditions. AXCELIS NV 8250 HT is designed to work with a variety of implant materials, including boron, phosphorous, arsenic, and silicides. It can be used for both single dose and batch/continuous dose implantation applications. The ion implanter is equipped with a FluenceMapTM Graphical User Interface (GUI) which provides real-time feedback on the implant process and enables real-time monitoring of implant conditions. Additionally, NV 8250 HT is engineered for easy maintenance and efficient operation, reducing downtime and maintenance costs. EATON NOVA / AXCELIS NV 8250HT is a reliable and versatile ion implanter which can be used for a variety of high-volume and high-precision implantation applications. It is designed to provide users with a precise and efficient implantation process with improved throughput, improved uniformity, and improved reliability.
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