Used EATON NOVA / AXCELIS NV GSD 200 #293817965 for sale

EATON NOVA / AXCELIS NV GSD 200 is a high performance ion implanter & monitor. This cutting-edge tool provides precise, reliable, and accurate implantation of ion species into semiconductor substrates. The GSD 200 ion implanter is designed to process a wide variety of materials from wafers to grapheme, metal films, nanowires, and other nanostructured materials. The ion implanter has a customizable heating system, allowing users to set the precise temperature necessary for efficient implantation. Its higher voltage capabilities enable easy processing of nanostructures with larger ion beam energy spreads, thus achieving higher implantation accuracy. Its multi-zone Faraday cage architecture provides a shield from extraneous electric and magnetic fields as well as better focusing of ion beams. The monitor capabilities of the GSD 200 offer reliable and accurate process control for better process consistency and monitoring of implanted doses. The monitor can detect subtle changes in the incoming ion beams, providing pinpoint accuracy in implanted doses. The control interface of the GSD 200 has a host of advanced features like a graphic user interface, macro programming, and a multitude of recurring process scripts. The total control over the implantation process allows for increased efficiency and faster delivery of implants. The GSD 200 also offers superior plasma uniformity and low-energy spread control. It has excellent beam-on-time regulation and control of the ion beam direction. It also allows the user to configure the system to compensate for aberrations in physical arrangement or vacuum environment. The GSD 200 provides the user with a turn-key solution for a variety of implantation processes. With its robust design, wide applicability, and advanced control features, the GSD 200 is the preferred choice for ion implantation and monitoring.