Used EATON NOVA / AXCELIS NV GSD 200 #9024429 for sale
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ID: 9024429
Implanter, 6"
Source head: enhanced source
High voltage bushing: standard
Extraction electrode: yes
Extraction: 80 kV
Source analyzer: triple indexed mass analysis magnet & power supply
RGA resolver: N/A
RGA chamber: N/A
HYT: N/A
MER: N/A
Charge control p/n: 1168890
Post accel elect: N/A
Flag Faraday: standard
In-air wafer handling:
Automatic notch aligner (dual sensor)
6" 4-cassette table
Dummy cassette 25-slot
Vacuum cassette
Load buffer #1
In-air robot
In-vac wafer handling:
In-vac arm
Holder
Unclamp
Elevator
Gryo drive: 2-axis variable implant angle, ± 12 degrees in both axes
Disk drive type: rotary drive
Disk standard disk
Cell controller: Cell 133
Dose controller: real-time patented dose control
SUN workstation:
SUN OS
SPARC 5 (Pri)
SPARC 5 (Sec)
SMIF: N/A
Disk chiller: HX-150
Compressor: Suzuki Shokan C300H
GeF4 (high pressure): N/A
PH3: (SDS) Brooks
BF3: (SDS) unit MFC
XE: N/A
Argon (high pressure): unit MFC
RP1: Ebara 40 x 20
RP2: Ebara 40 x 20
P1: Seiko Seiki H2000C
P2: CTI OB 8
P3: CTI OB 10
IG1: hot cathode ion gauge
IG2: N/A
IG3: hot cathode ion gauge
Currently installed.
EATON NOVA / AXCELIS NV GSD 200 is a high-energy ion implanter and monitor, designed to produce and monitor ions for the manufacture of semiconductor components. The NV GDS 200 is a reliable and advanced tool, designed specifically for integrating multiple ion implantation processes into one unified equipment and maximizing productivity, accuracy, and efficiency. AXCELIS NV GSD 200 comes equipped with four DC high-energy ion guns, each with its own shutter and independent power supply. The gun provides an adjustable beam energy range of up to 190keV, allowing for a higher tonnage and a wider range of implant functions. EATON NOVA NV-GSD-200 also features a powerful, in-situ monitor, capable of measuring ion beam uniformity and debris concentration in the ion implant zone. This monitor measures ions of any energy up to 190 keV, as well as their profile, current, voltage, and pitch angle. In addition, EATON NOVA NV GSD 200 is equipped with software functions for controlling settings and analyzing data. This software helps optimize the implant process, reducing process variability and delivering a consistently high quality product. EATON NOVA / AXCELIS NV-GSD-200 also features automated maintenance systems, designed to keep the system running at peak performance. The automated features include a visual fault unit, automatic shutdown of the power supply, and a safety machine to guard against implanter overheating. Overall, AXCELIS NV-GSD-200 is a powerful and reliable tool for precision ion implantation and monitoring. With its four DC ion guns, powerful in-situ monitor, and sophisticated automated maintenance systems, NV-GSD-200 allows for high precision processes, reducing process variability and guaranteeing consistently high quality products.
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