Used EATON NOVA / AXCELIS NV-GSD 200D #9268035 for sale

EATON NOVA / AXCELIS NV-GSD 200D is an advanced ion implanter and monitor equipment used for implanting and doping semiconductor materials. It is equipped with a variety of features, such as a high-precision integrated field setter, an arrhenius-style thermal buttstrap temperature controller, and a gas nozzle protector that help ensure accurate and effective doping. The system also features a variable energy ion source, for assuring repeatable dosage throughout the entire doping process. AXCELIS NV-GSD 200D offers a wide range of operating modes, each incorporating a specific set of parameters, allowing for accuracy and precision control over the implantation and doping of the semiconductor materials. The unit also features a unique, two-stage acceleration machine, which allows for faster, more uniform dose penetration, while still providing control over the acceleration parameters. Additionally, the tool's advanced filament health monitoring and feedback asset ensures that any misalignments or fluctuations are swiftly detected and corrected. EATON NOVA NV-GSD 200D also features built-in model data logging capabilities, allowing users to track the dosage and progression of the implantation/doping process in real-time. Using these reports, users can easily assess implantation uniformity, total dose, and process times, ensuring that the process is completed in optimum conditions. Additionally, data logging settings can be customized to suit individual needs, allowing for the management of large amounts of implantation data over lengthy times. Finally, NV-GSD 200D features intuitive user controls. Via an easy-to-use graphical user interface, users can quickly access and change all of the systems parameters and settings. This helps to simplify the operation of the equipment, and allows even novice users to achieve the desired implantation and doping results. Overall, EATON NOVA / AXCELIS NV-GSD 200D is a powerful implantation system, which helps users to achieve exceptional accuracy and repeatability while implanting and doping a wide variety of semiconductor materials. It is equipped with a variety of features that allow users to confidently control the charging, acceleration, tracking, temperature, and pressure parameters of the process, resulting in superior, uniform results. This unit comes highly recommended for businesses who rely on the precision and repeatability of the implantation/doping process.