Used EATON NOVA / AXCELIS NV GSD 200E #162060 for sale
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ID: 162060
Wafer Size: 8"
Vintage: 1996
High current ion implanter, 8"
With turnkey base
Specifications:
(25) Slots cassette
(4) cassettes capacity
ELS source head
(2) SUN Workstations
VME 177 cell controller
(2) SDS gas lines (ASH3 and PH3)
(2) HEWLETT-PACKARD Gas lines (BF3 and ARGON)
P-SHOWER Electron shower
Post acceleration high voltage, 80 KEV
Belt type rotary drive
AFFINITY Disk chiller
Variable implant angle, 2-Axis
Real time patented dose controller
STP H2000C Source turbo pump
Cryo pumps:
0B-8F P2
0B-10F P3
Compressor: 8200/8510
Monitor type: CRT
Standard GSD air robot
Power:
Total energy: 180 KEV
5E11~1E16 Ions/cm2 dose range
Throughput: 210 pieces/hour
1996 vintage.
EATON NOVA / AXCELIS NV GSD 200E Ion Implanter & Monitor is an advanced high-performance ion implanter capable of high-precision, large-area implantations that can handle a variety of materials. It features a reliable, rugged design and is equipped with a wide range of safety features to ensure operation is always safe. AXCELIS NV-GSD-200E is powered by a high-voltage DC source and is capable of producing low-emittance beams of up to 10 kW of energy. Its precise beam control and precise adjustment systems ensure a consistent doping distribution and accurate beam alignment. The device also integrates automated process control and a full suite of diagnostics, helping to simplify operations and ensure precise performance. This ion implanter is designed for semiconductor fabrication and offers a broad range of implantation energies, a wide range of available beam currents, and ion types that can be used for different applications. It has high-end positioning capabilities for precise implantation and a high-resolution beam current monitor equipment that provides real-time control of the implant dose. The device also has sophisticated electronic controls to ensure precise dose and alignment and reliable substrate handling. The device is protected by an e-beam safe cover to prevent damage to the implant materials and to ensure radiation safety during the process. EATON NOVA NV-GSD 200E also features an advanced thermal control system, allowing it to remain at a consistent temperature over temporary power outages and other changes in ambient conditions. It has a rigid and lightweight construction, making it ideal for a variety of industrial and scientific applications. Easy maintenance and clear instructions make the GSD 200E easy to use and maintain. In addition, it can be integrated with other equipment, ensuring a smooth workflow and maximum unit efficiency. NV GSD-200E Ion Implanter & Monitor is an advanced and reliable machine for performing precise and large-area implantations at a variety of energies. It offers a wide range of safety features and can be integrated with other systems, making it an ideal choice for industrial and scientific applications.
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