Used EATON NOVA / AXCELIS NV GSD 200E #163109 for sale

EATON NOVA / AXCELIS NV GSD 200E is a highly advanced ion implanter and monitor. It is designed to provide efficient, reliable, and precise dopant implantation across a wide range of substrates. The machine utilizes an ion source to generate a beam of ions that are then accelerated to the desired energy. This beam is then directed towards the appropriate substrates via an electrode, where the dopant ions are implanted into the substrate material. AXCELIS NV-GSD-200E features a unique digital drive unit that provides high-performance, accurate ion implanting results. This digital drive unit features a digital feedback loop that enables optimal implantation results with minimal "oscillation" of the beam. In addition, the digital drive unit can be adjusted to provide a wide range of implantation energies, ranging from 0.5 to 40 keV. The machine also consists of a robust monitoring equipment. The monitor provides real-time updates of the dosage and energy of each implant, as well as the substrate temperature during the process. As a result, the user can adjust the implantation parameters in order to fine-tune the implantation process for optimal results. EATON NOVA NV-GSD 200E features a vacuum system that maintains a clean implantation chamber during the process. This vacuum unit consists of both a venturi pump and a turbo pump, which are capable of maintaining a pressure of 10-6 from -9.0 to +9.0 inHg. As a result, the machine can be used in ISO 5 class cleanroom environments. Finally, NV-GSD-200E is highly safe and reliable due to its redundant safety and control machine. This tool provides redundant safety controls, alarms, and warning systems to alert the user of potential hazardous conditions. In addition, the machine is designed to reduce and eliminate the potential for arcing or other damage to substrates. In conclusion, NV GSD 200 E is a powerful and reliable ion implanter and monitor. It provides efficient, accurate implantations with its digital drive unit, while its monitoring asset provides real-time feedback of the substrate's condition. Its robust vacuum model allows it to be used in iso 5 class cleanroom environments, and its redundancy features ensure that its users are safe from potential hazardous conditions.