Used EATON NOVA / AXCELIS NV GSD 200E #293586689 for sale

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ID: 293586689
Wafer Size: 8"
Vintage: 2004
Medium current implanter, 8" Cassette to cassette Energy range: 180KeV No rough pumps Missing parts: Flow hood Lower machine front panels Power supply: 208 V, 97.0 A, 50 Hz, 3 Phase CE Marked 2004 vintage.
EATON NOVA / AXCELIS NV GSD 200E is a state-of-the-art ion implanter and monitor. An ion implanter is used in the semiconductor manufacturing process as it is responsible for introducing dopants, such as boron, phosphorus, and arsenic into a substrate material in order to create a desired electrical charge. AXCELIS NV-GSD-200E model from AXCELIS is built for the production floor and delivers superior performance for maximum throughput. EATON NOVA NV-GSD 200E features advanced high-energy beamline technology for increased accuracy, improved uniformity and greater dosage control. This ion implanter is equipped with a multi-filament high-current Cockcroft-Walton equipment, capable of delivering very large currents of up to 1000A to the substrate material. This creates a consistent, uniform implant profile across different substrates, leading to better performance. In addition to its advanced beamline technology, AXCELIS NV GSD 200 E is equipped with an accurate optical alignment system that allows for accurate placement of the mask on the substrate material. This ensures a precise implantation process with minimal mask misalignments. The ion implanter also includes a three-dimensional dose map analyzer and real-time feedback loop, both of which allow for precise control of the ion implantation process throughout the entire process. NV-GSD-200E also comes with a built-in monitor unit to ensure that the implantation process is running smoothly and efficiently. This monitor machine logs process and beamline data, and is able to detect any errors or malfunctions in the ion implantation process. This helps the user quickly diagnose and correct any issues, reducing downtime. Overall, AXCELIS NV GSD 200E is a powerful, reliable and flexible ion implanter and monitor. Its advanced beamline technology and optical alignment tool allow for consistent, uniform implants and precise placement of the mask. Its on-board monitor asset helps detect and diagnose any errors in the process, keeping downtime to a minimum. AXCELIS NV GSD-200E is the perfect choice for any production floor looking for superior performance, accuracy and control over the ion implantation process.
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