Used EATON NOVA / AXCELIS NV GSD 200E #9145264 for sale

EATON NOVA / AXCELIS NV GSD 200E is an ion implanter and high energy monitor used for semiconductor device fabrication. The GSD 200E is a particular type of ion implanter and high energy monitor which are used in fabricating integrated circuitry and microelectronic devices. This particular device is a pulse injection and high energy monitor with a monitored pulse capability allowing for precise and reliable implantation of many different types of ions. The GSD 200E is designed to provide high uniformity across the entire wafer, allowing for precise and repeatable control of the implantation profile. This makes it an ideal product for advanced semiconductor device fabrication. The device is equipped with an advanced set of controls, including precision current control, column selection, energy control, process timing and pulse settings. These settings allow for great flexibility and precise control of the implanting process. The GSD 200E has a high-performance ion source and column combination for optimizing ion implantation. This combination provides for a high level of precision and accuracy when implanting ions into the target wafer. This feature also ensures a repeatable and uniform implant profile over the entire wafer. The GSD 200E utilizes a high-speed contactless signal processing and performance feedback circuit for precise control of the implanting process. This circuit reduces equipment response time and maintains the integrity of the implant profile. The integrated high-precision current measurement system allows for precise current regulation. The GSD 200E is equipped with a real-time ion sort and impedance matching module to optimize the end result of the ion implantation process. This feature ensures that only ions of the desired type and energy level are being implanted into the wafer. The GSD 200E also includes a vision unit for accurate monitoring of the implantation process. This machine consists of a high-resolution CCD camera, light source, optical filters, and precision imaging software. This vision tool is a critical part of ensuring a uniform implant profile over the entire wafer. Overall, AXCELIS NV-GSD-200E is a powerful and reliable ion implanter and high energy monitor. This device is specifically designed to provide precise and repeatable control of the implantation process, with a high-performance ion source and column combination to optimize the end result. The additional features, such as a vision asset and ion sorting module, ensure that the ion implantation process is accurate and efficient.