Used EATON NOVA / AXCELIS NV-GSD-A-80 #9226069 for sale

EATON NOVA / AXCELIS NV-GSD-A-80
ID: 9226069
Wafer Size: 6"
Vintage: 1994
Implanter, 6" 1994 vintage.
EATON NOVA / AXCELIS NV-GSD-A-80 ion implanter and monitor is a high-precision tool used for implanting ions into semiconductor materials. It is a fully-automated equipment that can be used for single-wafer or batch implantation. The system features advanced electronics and vacuum technologies, enabling it to maintain high levels of accuracy and precision while delivering up to 80 kW of energy in a single shot. It is one of the most advanced implantation systems available on the market today. AXCELIS NV-GSD-A-80 features a state-of-the-art control unit that provides complete control over implant parameters, including the energy, electric field, ion dose rate, doping type and level, spot size, and progressive scan. This allows for extremely accurate implantation of a wide range of materials used in semiconductor manufacturing. EATON NOVA NV-GSD-A-80 also features a self-adjusting shutter machine that eliminates the need for manual adjustment. The tool is also equipped with a comprehensive, integrated monitoring asset that helps ensure process repeatability and repeatable process results. This monitoring model includes a range of sensors to provide feedback on beam intensity, current, power, energy, voltage, temperature, time, and additional parameters. It also includes an advanced monitoring GUI that provides a visual representation of the parameters and allows for quick adjustment if necessary. The ATI AXCELIS integrated implantation equipment is also equipped with a sophisticated cooling system that helps maintain optimum temperatures for the implantation process. This cooling unit serves to improve the accuracy and repeatability of the implantation process and helps to reduce downtime. NV-GSD-A-80 is a versatile tool that can be used for a variety of applications, including junction doping, contact doping, epitaxial site doping, sputtering, and plating. It is also well-suited for a wide range of materials, including silicon, gallium arsenide, indium phosphide, and a variety of other materials used in semiconductor fabrication. Overall, EATON NOVA / AXCELIS NV-GSD-A-80 is an advanced, fully-automated ion implanter and monitor that is designed for high-precision implantation of a variety of semiconductor materials. The machine offers comprehensive controls, an integrated monitoring tool, a sophisticated cooling asset, and a comprehensive GUI for faster data analysis. This allows for repeatable, high-quality processing results and improved process control.
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