Used EATON NOVA / AXCELIS NV GSDIII-90 #9059238 for sale

EATON NOVA / AXCELIS NV GSDIII-90 is an Ion implanter and monitor designed for high precision implantation and homogenous wafer coverage. It is widely used for a variety of applications in the semiconductor industry. The device has a 90 keV minimum acceptor supply, which provides optimum accuracy and uniformity of ion dosage in motion. A 100 uA to 1mA ion beam current range ensures high implantation performance. This is made possible by the device's patented screening electron gun and automated tweeter interruption mode. Additionally, multiple beam alignment options are available, including 1-dimensional, 2-dimensional, and programmable scanning, enabling precise and accurate patterned implantation. AXCELIS NV GSDIII 90 has a real-time end-of-shot monitor and feature, which provides real-time assessment of implantation parameters. This feature also assists in controlling Doppler broadening, improving wafer uniformity results. The monitor also features Total Implant Mass (TIM) calculation, allowing users to optimize dose and profile parameters and easily verify results. The device also features an automated accelerator safety system, including a motor-rotating batch, and an inertial damping system to reduce arcs and sputtering. Additionally, a total of eight independent ports are available for flexible support of gases and process gases. Moreover, EATON NOVA NV-GSDIII-90 supports a wide range of dopants, and can handle up to 16 different doping levels. It is also equipped with self-cleaning technology and limit detectors to ensure a safe working environment. EATON NOVA NV GSDIII-90 is a reliable and high precision ion implanter/monitor. It features a powerful 90 keV minimum acceptor supply and a wide range of processing options, allowing users to achieve homogenous, high-precision results. The device's advanced monitoring and automated systems ensure a safe and efficient operation.