Used EATON NOVA / AXCELIS NV GSDIII LE #9083651 for sale

EATON NOVA / AXCELIS NV GSDIII LE is an ion implantation tool and monitor used in the semiconductor industry. The device provides precise control over implantation parameters in order to achieve high accuracy results. The equipment is capable of accurately controlling beam currents, energy, implant species, and depth profiles to produce optimal structures for device applications. The system consists of a high-voltage power supply, damper, spreader, and separator modules, as well as a target cage, gas distribution unit, RF generator, shutter, monitor, and temperature/pressure controller. This ensures an optimal environment for implantation processes. The power supply is capable of providing up to 1,000 kW of power with a wide range of voltage regulation. This allows for rapid acceleration of the ion beam and precise control of the implant surface. The damper and spreader modules control the properties of the in-coming beam and help to minimize process variability resulting from uncontrollable source instability. The separator module effectively removes unwanted double ions and reduces implant material contamination. The target cage holds the device to be implanted and is made of a rigid material that can withstand high temperatures and pressures. The gas distribution machine provides a uniform environment for the ion implant process. The RF generator controls the transport of heavy ions from the source to the target. The shutter module adjusts light levels in the implant area and minimizes interference with an implantation process. The monitor continuously monitors the implanted wafer to ensure proper performance. The temperature/pressure controller can maintain a precise temperature and pressure within the target environment, allowing for optimal implantation results. AXCELIS NV GSDIII LE is a powerful and accurate tool for ion implantation and monitoring. Used in the semiconductor industry, this device is able to consistently provide reliable results with minimal interruption. Its precise control over implant parameters ensures a successful device structure for processing. This tool allows for a reliable and efficient implantation process, helping to increase productivity and quality.