Used EATON NOVA / AXCELIS Optima HD #9235241 for sale

EATON NOVA / AXCELIS Optima HD is a high-performance ion implanter and monitor typically used in microelectronics manufacturing. It is capable of precise, process-driven power control, delivering exceptional ion beam uniformity. It offers multiple beam sources that can be used to implant large area substrates, providing highly uniform implant energy and depth doses with no degrading of film properties. AXCELIS Optima HD is a powerful, flexible ion implanter capable of versatile operation and implementation for a variety of applications. It features a high-velocity beam with programmable control to deliver precise, uniform doping profiles for advanced devices. It can be used for everything from implantation of ultra-thick films to thin films for high-speed applications, and it can be optimized for a wide variety of ion type, energy, and dose requirements. The equipment also features a dynamic scan system for implantation of large area substrates, which provides even deeper, more uniform profiles. This unit is capable of delivering large doses over large areas with minimal energy loss, providing an improved implant uniformity and depth dose accuracy. It also allows for up to six different sources to be utilized for `multi-component` implantation of multiple ion types, providing a high degree of ion implant flexibility and optimization. EATON NOVA Optima HD also comes with a number of user-friendly features that simplify maintenance, increase uptime, and improve productivity. These include an automated machine for monitoring primary beam power, beamline environmental conditions, and vacuum pressure while also providing for an immediate response to high-temperature incidents or backflow. It also provides an advanced cooling tool and motion control technology that ensure an improved beam uniformity and process output while minimizing imbalances. Optima HD is an optimized asset for implanted semiconductor devices, offering reliable and accurate dose and depth distributions along with high-resolution imaging and process control. It is a suitable solution for advanced technologies such as MEMS, NEMS, and medical applications, and it is designed for reliability and performance. This model is an ideal choice for those looking to increase yield and improve throughput in their processes.