Used EATON NOVA / AXCELIS Optima HD #9257349 for sale

EATON NOVA / AXCELIS Optima HD is a state-of-the-art ion implanter & monitor used to implant ions into semiconductor materials. This is done to create transistors, hence increasing the performance of microelectronic components. AXCELIS Optima HD is the industry's most advanced implanter, combining the best of AXCELIS and EATON NOVA technologies. EATON NOVA Optima HD has a flexible, modular design that can be tailored to meet the production needs of each semiconductor manufacturer. It features advanced process control technologies such as Real Time Processing (RTP), Ion Range Monitor (IRM) and Pulse Modulation Control (PMC). The RTP ensures that the ion dose is accurately and uniformly delivered to the wafer, while the IRM and PMC allow for precise and precise control of the ion type and intensity. Optima HD also features an advanced optics equipment that enables high-resolution imaging of the implanted ions. EATON NOVA / AXCELIS Optima HD has a powerful proprietary source formation technology that ensures uniform ion source formation. This feature helps to optimize the performance of the device and produce faster processing times for high volume implants. AXCELIS Optima HD offers excellent performance and unmatched quality for ion implantation. It offers superior control of the ion parameters and better resolution of the implanted ions. The advanced optics system and the source formation technology further enhance the performance of the device. EATON NOVA Optima HD is equipped with a sophisticated automatic process monitoring unit, which allows the user to monitor the implantation process in real-time. This enables faster reaction times and more rapid turnaround. In addition, Optima HD is also capable of running multiple implantations simultaneously for maximum throughput. Overall, EATON NOVA / AXCELIS Optima HD ion implanter & monitor is a powerful and advanced device for high volume semiconductor processing. Its combination of advanced technologies enables superior control of the ion parameters and excellent resolution of the implanted ions. The automatic process monitoring machine and the source formation technology ensures faster processing time and improved uniformity of the ion implantation.