Used EATON NOVA / AXCELIS Optima HDxT #9115399 for sale

ID: 9115399
Vintage: 2011
Ion implanter, 12" SRA, PFG Source Manipulator XT (EVAL) Bushing source flange adapter Source turbo exhaust line Chamber liner Spare beam tunnel Roughing pumps: EDWARDS IGX100L EDWARDS iGX100M EDWARDS iGX600M Cryo pumps: (2) BROOKS 320FE BROOKS 250FE Turbo pumps: TP1: EDWARDS STP-XA2703CV TP2: EDWARDS STP-A1303CV Chillers: AFFINITY J Chiller GWN-ZRMK-BE55CBS6 AFFINITY F-Series FWA-032K-DD19CBD4 (2) BROOKS IS-1000 Cryo compressors 2011 vintage.
EATON NOVA / AXCELIS Optima HDxT is a high-performance, highly reliable ion implanter and monitor. It is designed to provide consistent and repeatable implantation of ions into semiconductor substrates such as silicon wafers. The high throughput of this equipment supports semiconductor processing capabilities that are crucial for many technologically advanced applications. It offers excellent flexibility for processing substrates of various sizes and materials, and its advanced ion source design ensures a high degree of repeatability and accuracy in the implantation process. AXCELIS Optima HDxT utilizes a bipolar ion source design, which enables the system to be adapted for use with a wide variety of ion species, including As, P, B, and others. It also supports a variety of energies, including low energy implantation as well as High Energy Ion Implantation (HEII). Utilizing a powerful beam transport unit, the machine is capable of producing high-precision implantations as well as maintaining a high degree of uniformity in the resulting substrate. To ensure precise implantation precision, EATON NOVA Optima HDxT also features advanced temperature control capabilities. Optima HDxT also features advanced process control and diagnostics systems, as well as advanced integrated analysis and report generation features. With its advanced process control, users can easily monitor and manage their process parameters throughout the entire implant process, including ion implantation energy, current, beam spot size, etc. Additionally, the tool also supports comprehensive calibration and diagnostic routines, allowing for unparalleled data acquisition and analysis capabilities. Additionally, EATON NOVA / AXCELIS Optima HDxT also includes an advanced integrated monitoring asset which enables users to monitor and adjust parameters during each of implant process steps. This model not only helps to ensure precise implantation accuracy but also allows users to easily optimize the process for a specific application's needs. Finally, the equipment also includes a comprehensive set of integrated safety features which help to ensure the safety and reliability of the process. In summary, AXCELIS Optima HDxT is a high-performance, highly reliable ion implanter and monitor. It supports a variety of ion species and energies, features advanced temperature control and process control systems, and utilizes a comprehensive set of integrated diagnostic and safety features. Through its advanced monitor system and user-friendly calibration and test routines, EATON NOVA Optima HDxT offers reliable implantation accuracy, repeatability, and uniformity for a wide range of semiconductor processing applications.
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