Used EATON NOVA / AXCELIS Paradigm XE #9241171 for sale

EATON NOVA / AXCELIS Paradigm XE is an advanced ion implanter and monitor that supports ion implantation and ashing processes for a wide range of semiconductor and related applications. Utilizing innovative technology, AXCELIS Paradigm XE provides a range of features that ensure accurate and consistent ion implantation. EATON NOVA Paradigm XE offers an efficient im-plantation system through its advanced contamination control technology. The high-efficiency filtration module utilizes particles-retaining technology to ensure cleanliness of the plasma and process gases by efficiently removing both particulates and residual gas contaminants from the process chamber. The sophisticated, cylindrical plasma source delivers increased ion beam uniformity and provides a high, linear current that allows the precise control of impurity profiles. The advanced Paradigm XE also features advanced computer control technology for maximum accuracy of beam overlap as well as the precise placement of impurities in the substrate material. EATON NOVA / AXCELIS Paradigm XE's flexible configuration components guarantee compatibility with various types of wafer configurations as well as a host of other components, including variable axis spatial deflectors, stripping rods, output stage linearizers, and DC magnetron sources. Plus, the on-board diagnostics software package allows quick setup of implantation parameters and allows for full control of the device. The advanced AXCELIS Paradigm XE also offers a materials processing monitoring suite that includes extensive plotting of substrate resistivity and uniformity. It also provides automated data acquisition and graph generation to track multiple ion implantation parameters over time. EATON NOVA Paradigm XE provides an efficient implantation system for a wide variety of ion implantation and related processes. Its innovative technology helps to maximize equipment accuracy and efficiency while providing clean process chambers with improved beam uniformity and precise control of impurity profiles. Plus, the flexible configuration components and monitoring suite ensure compatibility and monitor data to offer maximum accuracy of implantation.