Used EATON NOVA / AXCELIS Paradigm #9215196 for sale

EATON NOVA / AXCELIS Paradigm is a modern ion implanter and monitoring equipment that has been designed to provide improved precision and accuracy in the processing of wafers in the semiconductor industry. It is responsible for the implantation of ions into the wafer surface during the fabrication process, and monitoring their deposition and motion. The system features a high-precision ion source and energy controller, allowing for precise control of the implanted layer's characteristics. The chamber is also equipped with a loadlock unit and a sophisticated vacuum machine, allowing for efficiently processing of multiple wafers in a short period of time. The ion source is powered by a linear accelerator and is able to achieve a range of energies, resulting in more accurate implantation doses. The source is protected by a quartz cylinder, which helps minimize contamination. The beamline design of the tool utilizes a parabolic mirror, equipped with an electrostatic deflector, to accurately scan across a target area. This ensures precise implants that are evenly distributed across the wafer's surface. The asset also provides for real-time monitoring of the implanted layer through the use of a beam position monitor and a residual gas analyzer. These measurements are used to verify the accuracy of the ion implantation. AXCELIS Paradigm provides state-of-the-art precision and accuracy in the processing of wafers for the semiconductor industry. It provides a high-precision ion source, along with sophisticated vacuum and loadlock systems, as well as real-time monitoring capabilities. These features allow for precise implantation of layers that are evenly distributed across the wafer's surface to ensure accurate results. The model is a valuable tool for those who are looking to improve the efficiency and quality of their wafer processing.