Used EATON NOVA / AXCELIS Paradigm #9235773 for sale

EATON NOVA / AXCELIS Paradigm is a robust and reliable ion implanter and monitor designed for enhanced ion implantation and precision ion bombardment. It combines a highly efficient and reliable medium-energy (30-60keV) ion implantation equipment with a comprehensive monitoring system. It is designed to eliminate unwanted beam contaminants, minimize byproduct chamber contaminations, and optimize beam movement. AXCELIS Paradigm features a unique cylindrical implant chamber. This cylindrical chamber has reduced off-axis impurity levels, increased uniformity of beam intensity and improved surface treatment of the specimen. This allows for precise ion bombardment with increased efficiency. EATON NOVA Paradigm unit also provides a reliable and stable high-voltage power supply, which ensures that the specimen receives the proper implantation voltage without fluctuation. The includes an ion source with a circularly symmetric lens that provides uniform implantation and minimized beam contamination. An etched extraction grid ensures that the beams are clean, and the magnetic filter provides further beam purification. The advanced advanced monitoring machine uses an integrated front-end computer interface to display run parameters to monitor the tool's performance. This allows for adjustments to implant conditions so that the asset is in control and operating correctly. Paradigm also utilizes gas box structures and smart vacuum capability to minimize any contamination in the ion bombardment chamber. The vacuum model can be adjusted to the optimum partial pressure for different materials and is critical for achieving precise beam energy. EATON NOVA / AXCELIS Paradigm is an advanced and reliable ion implanter and monitoring device, providing a uniform implantation with minimal contamination. Its cylindrical chamber design ensures accurate beam positioning and repeatable results, while its sophisticated monitoring equipment enables real-time monitoring and control of all run parameters. AXCELIS Paradigm is ideal for medium-energy ion implantation and offers outstanding performance in precision deposition of ultra thin films.