Used EATON NOVA / AXCELIS Purion H2 #9292991 for sale

EATON NOVA / AXCELIS Purion H2 is an ion implanter and monitor which is designed to handle a wide variety of ion implantation needs. AXCELIS Purion H2 delivers optimized beam uniformity, precision, and excellent contamination protection to ensure multiple implantations can be achieved at the highest level of repeatability. It has a maximum input beam current of 1.4 mA, and is capable of achieving a high level of output voltage, making it highly suitable for heavy doping in a wide variety of applications. EATON NOVA Purion H2 is fully automated, allowing the user to program and monitor the beam parameters which can be adjusted as desired throughout the entire implantation process. The automated functions include beam intensity control, adjustment of beam electrode voltage, and emission current selection. Purion H2 is capable of accepting a wide range of source materials, including Boron, Carbon, Oxygen, Nitrogen, Noble Gases, and many more. It is also equipped with a console which houses the process control electronics, as well as a user interface to allow for the monitoring of the implantation process. The user interface is designed to be straightforward and intuitive, allowing users to adjust the parameters accurately and easily. Additionally, EATON NOVA / AXCELIS Purion H2 features an integrated safety system which includes a splash zone and protective cover in order to safeguard against any contamination or harm to personnel. The entire system is built around a state-of-the-art vacuum sealed chamber, ensuring that the highest available implantation rate is achieved. AXCELIS Purion H2 can also be programmed to perform multiple simultaneous ion implantations, adding to its versatility. Furthermore, an integrated software package is included in the package which is designed to analyze and monitor data in order to enable process optimization. In conclusion, EATON NOVA Purion H2 is an ion implanter and monitor which offers a wide range of features, including optimized beam uniformity, precision, contamination protection, and high output voltage. This enables Purion H2 to handle a variety of ion implantation needs, providing a highly repeatable, reliable, and versatile system.