Used CARL ZEISS CDC 200 #9185363 for sale

CARL ZEISS CDC 200
ID: 9185363
Critical dimension controller system.
CARL ZEISS CDC 200 is a state-of-the-art mask generation and production equipment, specifically designed to enable sophisticated, large-scale photolithography processes. It is engineered to provide an efficient, cost-effective solution for fabricating micro, semiconductor, and electronic components. The system offers a variety of features including high resolution beam focusing capability for pinhole mask making and variable pattern size and mask apertures for high-definition imaging. Its complete integrated solution also includes advanced mask layout options, automated testing and characterization software, advanced design database for patterning and etch process, and an automated back end interface. In addition to these benefits, the unit is designed to provide high throughput performance, enabling users to quickly manufacture multiple masks simultaneously. It can produce up to 9-inch masks per process cycle, and its advanced pre-production workflow systems provide for multi-layered, high-definition imaging capability. CDC 200 is also featured with a powerful and flexible control machine that can be customized and configured to meet specific requirements. This control tool utilizes intelligent software tools to monitor and control every aspect of the mask production process, from pattern generation to alignment and beam exposure processes. CARL ZEISS CDC 200 provides specific features to help ensure precise alignment, positioning, and accuracy. This includes error checking algorithms, an automated software-aided alignment process, and 3D measurement functions. All of these features help to ensure reliable and precise production results. Overall, CDC 200 is an ideal asset for high-volume mask production operations. It offers an efficient and cost-effective solution for fabricating micro, semiconductor, and electronic components. Through its various advanced features, the model offers superior mask layout, alignment, and patterning accuracy. It also provides high throughput capabilities, enabling users to quickly manufacture multiple masks simultaneously.
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