Used DAVID MANN / GCA 3696 #174319 for sale

DAVID MANN / GCA 3696 is a highly advanced mask generation & production equipment that is designed to streamline the semiconductor fabrication process. This system utilizes vacuum technology to offer a high precision and high throughput mask making solution. With outstanding performance and a high level of automation, this unit is well-suited for a broad range of challenges associated with the semiconductor production process. GCA 3696 consists of several components typically found in semiconductor fabrication setups. The machine is comprised of a mask aligner, exposure source, light exposure tool, and exposure microscope. The exposure source is a key component and is responsible for the actual creation of the masks. It is a high-precision optical asset that contains lasers capable of precisely exposing the photoresist layer used to fabricate integrated circuits. The light exposure model is responsible for modulating the exposure time and intensity to obtain the desired results. The mask aligner is responsible for properly aligning the photoresist layer to the circuit layout, and the exposure microscope is used for accurate optical measurement and confocal inspection. DAVID MANN 3696 is specifically designed to make masks quickly and accurately by automating the mask making process. It utilizes a advanced computer control equipment and imaging to optimally align patterns on the photoresist layer. This allows it to make masks quickly and accurately, ensuring the highest quality results. The system is well-suited for high-volume production, drastically reducing the time it takes to create a single mask. In addition to mask making capabilities, 3696 can accommodate post-exposure process steps such as developing and baking. This allows the operator to process the photoresists quickly and efficiently for a variety of different circuit types. DAVID MANN / GCA 3696 is a highly advanced and versatile mask generation & production unit. It provides an automated, high precision, and high throughput mask making solution, ideal for a broad range of semiconductor production processes. With its advanced computer control machine, advanced exposure source, and post-exposure process steps, GCA 3696 is capable of producing high quality results in reduced time and cost.