Used DAVID MANN / GCA 3696 #9283456 for sale

DAVID MANN / GCA 3696 is a next-generation multi-cycle mask generation and production equipment. It utilizes state-of-the-art lithographic and process technologies to provide high-resolution, customized mask patterns in a cost-effective manufacturing environment. GCA 3696 can generate, process, and inspect complex photomask patterns quickly, accurately, and reliably. It is equipped with stepper-level projection optics, which is capable of producing the highest power and resolution needed in state-of-the-art Lithography. It has an auto exposure system that can handle up to four exposure times per pattern, increasing accuracy and mask complexity. DAVID MANN 3696 has a high-level mechanical design, featuring a new frame concept that dramatically reduces vibration level and structural thermal expansion. It also uses advanced control systems to ensure accurate and reliable manufacturing and inspection processes. It has an automated alignment and placement unit that optimizes not only accuracy but also throughput. In addition, 3696 offers advanced defect detection abilities. Its multi-layer systems can identify multiple defects including voids, edge defects, scratches, thinning, sidewall defects, missing features, and debris. Through the utilization of advanced image processing techniques, the machine can detect defects at <10nm resolution with a high sensitivity. The tool supports various mask formats, including BGA, BSR, DAL, ESR, FPGA and GDS-II. It also supports synchronous operation with a VME-based, C-language-programmable control asset. Moreover, DAVID MANN / GCA 3696 has enhanced productivity and cost-effectiveness through a rollarized wafer handling model with long wafer cassette life. In short, GCA 3696 offers a complete mask generation and production equipment, combining high-resolution, high performance, high accuracy, and high defect detection to meet the demands of the leading chip and photomask manufacturers in the industry.