Used ELECTROMASK / TRE 251CC #9288863 for sale

ID: 9288863
Pattern generator Stand alone With (3) microns Plate sizes: 3x3" to 8x10" Glass Step sizes: 0.395 x 0.395" Wave lengths: 365 nm and 405 nm used for Mercury arc lamps.
ELECTROMASK / TRE 251CC is a cutting-edge mask generation and production equipment designed to help fabricators and manufacturers efficiently create photomasks for use in various applications. The system features a production-ready workflow with advanced data preparation to create detailed, accurate photomasks in a wide variety of sizes, materials, and shapes. It is equipped with a TRE 251CC sputtering unit, which is capable of deposition rates up to 100nm/sec and with a narrowest line width of 20nm. This allows for precision etching of photomask patterns, creating intricate detail for advanced applications. ELECTROMASK 251CC employs advanced pattern preparation and manipulation software for creating a variety of masks, from custom shapes to detailed ones, enabling rapid mask creation in a single run. It also utilizes a mask management software which helps manage production and workflow while reducing errors. Moreover, the machine integrates a web-based user interface for remote access and usage, allowing for remote control of production. 251CC also features a powerful microwave power source which is capable of generating up to 1000 watts of power and a digital display to speed etching and deposition rates. It has an optional inline metrology tool which can be used to ensure accurate patterns, as well as a multi-vacuum source for etching control and uniformity. In addition, the asset's modular design allows for easy installation and maintenance. Overall, ELECTROMASK / TRE 251CC is an innovative and robust mask generation and production solution. Its advanced features, including its high accuracy deposition rate, precise etching and pattern preparation capabilities, and its cutting-edge software and user interface designs, make it an ideal choice for high-quality mask production. Manufacturers and fabricators can benefit from its ease of use and access to advanced, industry-leading technology, helping them optimize their production processes and make more efficient, cost-effective photomask production.
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