Used ETEC Mebes 4 #9252186 for sale

ETEC Mebes 4 is an advanced mask generation and production equipment designed for the purpose of producing integrated circuit masks for both commercial and military applications. The system is based on an open architecture platform which allows for the integration of various software and hardware components. It is able to support various lithographic processes like stepper, scanning electron beam, as well as raster and vector plotters. The first models of the unit were built with the purpose of providing an effective method of generating integrated circuit masks through the use of various sophisticated algorithms. It employs a number of features in order to provide an optimal outcome. These features include the ability to compensate for over-exposure, sidewall smoothing, misalignment and aperture sizes. The machine also has the ability to define mask patterns with high resolution and perform exposure control. In addition to this, Mebes 4 has the capability to support the generation of integrated circuit masks for a variety of wafer sizes. This ability allows for the production of masks which are suitable for different applications. The tool also makes use of high-precision grinding and etching techniques in order to produce high quality masks. In terms of software, ETEC Mebes 4 asset runs the well-known Photon Exposure Tool (PET) software. This software is designed to provide users with the necessary tools to create high quality integrated circuit masks. It also contains a large library of predefined layout templates which can be used for the creation of various layout definitions. The model is highly automated, allowing for automated processes such as automatic alignment, placement, exposure and fabrication. It boasts a number of features which make it a powerful tool in the manufacturing of integrated circuit masks including the ability to define high-resolution structures as well as large scale structures in a single operation. Mebes 4 also provides the user with the necessary design rules to create masks which meet the current industry standards. This is done through the implementation of a design rule checker (DRC) as well as a library of configurable design rules. Together with its sophisticated algorithms, the equipment is an invaluable tool for the production of integrated circuit masks.