Used ETEC Mebes 4000 #9412599 for sale

ETEC Mebes 4000 is an advanced mask generation and production equipment for use in the fabrication of submicron electronics and MEMS-based components. It features a high-precision wafer exposure system, an automated wafer printing unit, and a high-resolution photomask inspection machine. The advanced wafer exposure tool allows for precise and repeatable lithographic patterning and imaging of the exposed area. The asset incorporates a high-resolution diffraction pattern and prober capable of accurately controlling the exposure of the edge boundaries and pattern orientation. The very fine accuracy and repeatability in the exposure process helps to reduce the possibility of error in the imaging process. The automated wafer printing model is a fully integrated and automated wafer printing equipment that allows for fast, high-resolution printing and accurate placement of the finished pattern on the substrate. The system features a state-of-the-art self-aligning mask alignment unit, ensuring accurate printing and placement of the printed pattern. Finally, the high-resolution photomask inspection machine included in Mebes 4000 permits the inspection of the finished photomask for any errors or defects. The photomask can be inspected at different magnifications and light intensities, allowing for the precise detection of defects. In summary, ETEC Mebes 4000 provides advanced mask generation & production capabilities for submicron electronics and MEMS-based components. It incorporates high-resolution diffraction pattern and prober, an automated wafer printing tool, and high-resolution photomask inspection capabilities into a highly repeatable, precise and integrated asset.