Used ETEC Mebes 4500 #9087976 for sale

ETEC Mebes 4500 is a mask generation and production equipment designed to streamline the process of making lithographic masks. This system is capable of generating or cleaning up existing design data, resulting in optimized artwork ready for lithographic production. Mebes 4500 is built to deliver superior yield and productivity. This hardware is equipped with high-end photon-beam lithography, capable of intricate mask patterns with low-noise output. Its built-in defect correction function significantly reduces wasteful rework and repair time. The unit is engineered for manual loading, allowing full control over the lithographic pattern placement on the mask. This machine can also perform automated patterning moves for high-volume runs. With its advanced imaging methods, the tool is able to faithfully reproduce fine details. It supports a variety of photomask substrates, allowing it to generate masks for both conventional and exotic semiconductor devices. The 4500 offers a wide range of features that enhance production turnaround time and minimize errors. Its ergonomic design is user-friendly and reduces operator fatigue during long runs. Its modular, expandable architecture allows for the configuration that best fits your workflow and user preferences. This asset's variable job splitting, incident light corrections, and computer aided design are just a few of the features that make it an ideal tool for mask production. ETEC Mebes 4500 mask generation model is an efficient and user-friendly tool for lithographic mask production. Its state-of-the-art features and functions allow for maximum yields while decreasing turnaround time and production errors. These features, combined with its highly configurable design, make it an essential tool for production level mask generation.