Used ETEC Mebes 4500 #9396894 for sale

ETEC Mebes 4500 is a mask generation and production equipment that allows the mass production of high-precision photomasks used in the manufacture of semiconductors. It utilizes a state-of-the-art laser-based direct writing technology that enables ultra-fast writing of complex features with unparalleled accuracy and repeatability. This cutting-edge system is capable of generating a multitude of intricate mask patterns with sizes ranging from 3μm to more than 50μm. Mebes 4500 features four laser exposure heads, two-dimensional imaging, along with motion control of the address head, reticle stage and wafer/mask stage. This ensures precise action of writing, imaging, aligning and homogenizing the mask patterns to the desired accuracy requirements. In addition, the unit incorporates a reticle process optimization algorithm that provides consistent, repeatable results by making adjustments during the initally-specified pattern sequence. The highly precise and highly repeatable mask fabrication process of ETEC Mebes 4500 ensures that the most complicated designs and the most advanced lithography processes can be achieved. This powerful machine is capable of producing masks with a resolution of up to 5000 exposure angles, 6x better than traditional photo-masks. It also boasts impressive speed, generating masks up to 40 times faster than alternative technology. A number of advanced inspection capabilities are also included, such as defect map analysis, ASML spot size control and high-throughput wafer inspection. The tool also supports wafer backside operation for 3D structures and a proprietary Image Split/Merge processing for extremely large masks. Mebes 4500 is an ideal solution for mask makers, generating high-precision masks with repeatability far superior to any other asset. Its laser-writing process ensures unparalleled precision and speed in the production of the most complicated and advanced mask patterns.