Used MICRONIC 6D-2V #9259005 for sale

ID: 9259005
Vintage: 2014
Laser system West wind spindles Electronic depth control and broken bit detection Indexing pressure foot Linear drive motors: X, Y, Z Laser diameter check and dynamic run out,: 22" x 30" SIEB and MEYER 84 controllers Operating system: Windows 7 HITACHI Cassette system 2014 vintage.
MICRONIC 6D-2V Mask Generation & Production Equipment is a high-performance semiconductor device manufacturing solution. 6D-2V system is designed for silicon based processes and applications from 1 to 6 microns. It is equipped with a superior 6-axis production platform that ensures the highest accuracy and precision in yield and throughput. It features a unique mask aligner platform with independently adjustable stages for advanced pattern alignment, a high-precision scanning unit for accurate mask positioning, and a high-speed mask alignment controller for handling multiple hardware and software applications. MICRONIC 6D-2V machine offers a variety of features geared towards enhancing the operations of high-volume semiconductor manufacturers. It is equipped with a single-stage wafer-to-mask tool for direct imaging of the working wafer. This feature allows devices with a maximum size of 50mm to be directly imaged without any external tracking. It also offers a unique double-stage wafer-to-mask asset that enables a stable, high-resolution mask generation for photomasks with a maximum size of 200mm. Using a high-bandwidth, low-noise high voltage amplifier, 6D-2V model can achieve a 4-micron exposure accuracy with its efficient and precise pattern image translation. An improved optical path ensures reliable throughput and minimal reworking. Its advanced optical equipment also provides a wide dynamic range of up to 2000 exposure steps per frame and features superior aberration performance. MICRONIC 6D-2V system also offers an integrated resist and anti-reflection coating (ARC) layer capability to ensure the highest mask resolution and imaging accuracy. It is also equipped with compliant multi-layer mask merging to reduce the cost of multi-layer imaging and inspection. The multi-layer mask merging also ensures accurate positioning and proper alignment between layers. 6D-2V unit also provides a high-speed, low-noise high speed mask inspection machine for both 2D and 3D masks. It supports various formats of inspection reports including optical image detection, edge detection, point-line-circle detection, and false-pattern image detection. With its high-precision alignment tool, the registration between patterns can be perfectly achieved. MICRONIC 6D-2V asset also features various additional accessories, including storage cabinets, a multi-station vacuum cleaner, a pattern alignment adjustment manual device, a tool-kit for mask alignment and maintenance, and a product traceability model. It also offers a reliable auto-align unit which allows mask alignment to be done with speed and accuracy. 6D-2V ultra-low thermal drift and low vibration construction also ensures a perfect stability in the long-term. With the high-precision optics, patterned mask registration and automation capability, MICRONIC 6D-2V equipment is a leading mask production system. It provides excellent resolution, throughput, precision, and accuracy for high-volume semiconductor production.
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