Used MICRONIC Mach 2 #9258989 for sale

MICRONIC Mach 2 mask generation & production equipment is a versatile, high-precision equipment system that enables the creation of various physical masks for microelectronics applications. The unit uses photolithography and electron-beam (e-beam) technology to generate and process masks onto and through substrates. It offers the flexibility and precision necessary for prototyping, high-yield mask production, and QC/QA operations. Mach 2 features a 300mm wafer stage to enable movement of a mask work surface along the x, y, and z axes onboard the machine. The navigation tool precision is 0.1 μm with travel speeds of up to 140 mm/s. It is capable of standard, multi-mask, and multi-step methods. A 2kW ion source and 6-axis positioning asset allow for a wide range of devices to be patterned into masks of up to 6 inches in diameter. The ion source provides optimal dose control when using either CF4 or Ar ion etch processes. Utilizing an automatic precision wafer alignment model, MICRONIC Mach 2 is capable of multi-step alignment and production mask creation of up to 150 mm in size. Mach 2 can be used to create physical images up to 0.35μm resolution and feature sizes up to 500μm on a single substrate. For comparisons and QC/QA processes, MICRONIC Mach 2 also outputs production mask images as digital bitmaps (DFT-files). Mach 2 is making mask generation & production faster, more efficient, and more precise. By using advanced photolithography and e-beam technology, it provides a quick throughput and consistently high-precision production of photolithographic patterned masks. And its ability to process large work areas make it suitable for prototyping, production QA/QC processes and other applications.