Used MICRONIC MP-80 #9153039 for sale

MICRONIC MP-80 is a mask generation and production equipment designed to rapidly produce high resolution micro masks required in the fabrication of MEMS, compound semiconductors, and ICs. In operation, MP-80 employs a full-site, direct write electron beam to accurately generate masks with critical dimensions as small as 0.1µm. The system is outfitted with high precision translation stages for XYZ movement of the mask substrate, as well as a Software-Controlled Optics Unit (SCOS) to ensure consistent image quality and reduce misalignment errors. In addition, MICRONIC MP-80 is integrated with an innovative low loss electron beam Exposure Tool (LET). This tool ensures that the electron beam always remains in focus, compensating for potential surface contours of the mask on the fly. This is accomplished by measuring the electron beam position in real-time and adjusting the beam focus accordingly. MP-80 is also equipped with an in-situ flatness measurement machine to detect substrate warping and other defects in the mask material prior to fabrication. MICRONIC MP-80 is also designed for ease of use. Its user interface allows the user to intuitively set up and run masks from existing drawings or create their own designs. Features such as mask data processing, feature placement, verification, and beam shaping tools are all available with the supplied software package. The tool also comes with a library of standard element patterns which can be quickly incorporated into a mask design. MP-80 is a highly reliable, reliable asset for mask generation and fabrication. Its high precision drive model and advanced process control capabilities are more than capable of achieving a start-to-finish throughput of 72 masks in 1 hour, with a resolution of 0.1µm. This makes it ideal for a wide variety of applications in the fabrication of MEMS, compound semiconductors, and ICs.