Used ORIEL 8405 #9261501 for sale

ORIEL 8405 is an innovative mask generation and production equipment that can be used to create lithographic masks for various processes and applications. 8405 utilizes the advanced projection optics of the FUJIFILM Arcus E-series optical stepper/scanner in combination with the FUJI Nonstop FPA 9000 dielectric mask mark system to produce high quality masks with high precision and repeatability. ORIEL 8405 is capable of producing single and double exposure masks as well as inverse masks. It features a 2kW Xe-lamp illumination unit which combines high illumination uniformity and low line and space pattern distortion, making it ideal for a variety of lithography tasks. The illumination machine features a built in optical shutter tool which allows the selection between 15mm, 20mm, 30mm, 40mm, 50mm, and 60mm mask sizes. The asset also features an exposure unit using the latest chillers, providing enhanced shortening of the exposure time and minimized thermal drift. 8405 model also utilizes an advanced radiometer for accurate measurement of light levels from the exposure source. It has a central imaging equipment comprising of a dual-mirror F-Theta lens which provides an impressive 5X optical magnification. The system also utilizes a Charge Coupled Device (CCD) sensor which increases resolution accuracy and provides excellent repeat image capabilities. ORIEL 8405 unit can process both positive and negative patterns as well as grayscale and color. The machine includes multiple image processing functions like linearization, mid-tone-correction, flare-correction, noise-reduction, contrast-adjustment, and gamma-correction. Additionally, the tool also has an automatic alignment function, jump alignment function, and a drift compensation function. It can also generate test patterns for checking asset resolution, linewidth, and aberration. Finally, 8405 comes with a Windows-based mask editor and support software which enables selection of exposure/exposure time, pattern type, and light levels. The software also includes a range of features to facilitate efficient fabrication of masks. In conclusion, ORIEL 8405 is a powerful, reliable mask generation and production model that can be used to create lithographic masks of high accuracy and repeatability. With its advanced projection optics, efficient illumination equipment, and support software, this system can be used for a wide range of applications.