Used QUANTRONIX DRS 840 #9396110 for sale

QUANTRONIX DRS 840 is a high-performance mask generation and production equipment. It is designed for advanced microlithography applications, including the inspection, characterization, and fabrication of mask substrates and structures. The system is capable of producing a wide range of photomasks, from standard single-layer masks to multi-layer masking systems with precise registration and critical overlay accuracy. DRS 840 is a cost-effective solution for industrial scale microlithography, with smart features that optimize throughput and reduce cost. The unit integrates with QUANTRONIX innovation suite of mask authoring, mask inspection, and metrology tools. This includes a powerful and automated mask authoring machine with advanced patterning algorithms to precisely generate photomasks. It is equipped with a highly sensitive automated mask inspection station to quickly identify defects in the photomasks, and a state-of-the-art metrology tool for in-depth analysis of structures down to the sub-micron scale. All of these elements are easy to operate and control with an intuitive graphical user interface. QUANTRONIX DRS 840 allows for a wide range of photomask substrates and patterns, including EAA, positive, negative, and MDO (Multi-Dimensional OPC). The asset can also handle a wide range of spot sizes, from 250 nm to 25 μm. The model includes an integrated vacuum chuck, allowing for fast and easy mask loading and unloading. It is also equipped with a built-in process monitor to ensure process consistency and repeatability. DRS 840 is designed to provide a consistent and reliable production process. It offers a fast exposure time of 2.5 s and is equipped with auto-focus and auto-calibration features to ensure accurate exposure. It also includes an in-line laser monitoring equipment, which constantly measures the laser power level and beam quality, and reports any degradation or other potential issues. QUANTRONIX DRS 840 is designed to minimize waste, reduce cost and optimize throughput. It offers automatic mask level substrate control, automatic exposure repeatability, and automatic contamination detection features. It also includes a highly configurable set of software tools that allow users to simulate exposure and analyze complex photomask patterns. The system has a process control ability that provides users with the flexibility to customize their processes for different materials and substrate requirements. DRS 840 is an excellent choice for advanced photomask production. Its advanced features and sophisticated automation make it an ideal choice for any industrial-scale microlithography operation. It provides the precision and reliability needed to produce sophisticated photomasks and ensure accurate and repeatable production results, while also serving as a cost-effective solution for industrial scale applications.