Used ZEISS CDC32 #9222612 for sale

ZEISS CDC32 is a mask generation and production equipment used for the lithographic process. It is based on an IBM-compatible PC workstation and a ZEISS SEM8900 Scan Electron Microscope (SEM). ZEISS CDC 32 system combines both the advanced SEM technology and a software-based unit. The SEM8900 is a field emission scanning electron microscope that provides high resolution imaging and is used in the creation and modification of photomasks. It is equipped with a variety of detectors including secondary electron and backscattered electron detectors to enable imaging of various features on a specimen. The software-based machine includes a graphical user interface (GUI) that allows the user to easily create and manipulate photomask designs, as well as a database to store the resulting designs. CDC32 tool has several features that allow for efficient mask design. First, it has a feature extraction tool that can identify features on a specimen that are too small to be identified by eye or with traditional photoemission exposure techniques. It also has a "turn key" feature that allows users to upload multiple images into the database without having to manually manipulate the design. In addition, the asset is equipped with a z-axis scan to provide a three-dimensional image. CDC 32 model is capable of creating highly accurate masks for a variety of applications. It offers a variety of design options, such as hexagon shapes, fractal shapes, and more. The equipment also offers a variety of design parameters, such as size, position, groove depth, and beam pen size. Additionally, the software-based system allows for post-design modification of masks to add, modify, or delete image features. Finally, the unit provides tools for photolithography process control. These tools include process parameters, such as dose and exposure time. The machine is also capable of providing feedback on the lithography process to allow for optimization of processes. In summary, ZEISS CDC32 tool is a powerful and versatile mask generation and production tool. It is based on a SEM8900 Scan Electron Microscope and software-based asset that provides a variety of tools and features to enable efficient mask design and manipulation. It is capable of creating highly accurate masks for a variety of applications and can provide feedback on the lithography process for process optimization.