Used ZEISS CDC32 #9386127 for sale

ZEISS CDC32 is an advanced Mask Generation & Production equipment which is primarily used in semiconductor chip manufacturing. It has been designed to provide precise patterning and critical overlay accuracy, enabling the production of high-performance devices with high yield. Its features include a wavelength-selectable laser source for direct patterning, advanced fabrication and masking techniques, and automated equipment management and process monitoring. ZEISS CDC 32 system has three main components; the direct-write lithography unit, the mask making and metrology machine, and the machine automation tool. The direct-write lithography asset is the foundation of the model, and uses excimer pulsed laser technology to directly pattern the chip wafer in a parallel architecture. The high energy permitted by this laser allows it to draw 500nm structures with an accuracy of 5-20nm. This resolution is so precise that it allows for complex memory architectures when used with modern three-dimensional (3D) processor designs. The mask making and metrology equipment is equally important, as it automates the entire process of creating the photomask. It uses a state-of-the-art Optical Tomography module that processes metrology images of the whole photomask at high speed. This module then patterns and measures the photomask to ensure that the mask is in accordance with the design. Once the design is validated, the system is sent to the production station to be printed. The automated equipment management unit ensures that the entire machine runs at peak efficiency, with exact compliance of design specifications. It automatically controls the cleaning tool at regular intervals and also schedules periodic calibration of metrology instruments, mask making machines and lasers. CDC32 asset provides the highest level of design and patterning accuracy, enabling complex high-performance designs to be produced with the utmost accuracy. It is the perfect choice for chip manufacturers who are looking for a reliable and efficient Mask Generation & Production model.