Used KLA / TENCOR 5200XP #9236317 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
![KLA / TENCOR 5200XP Photo Used KLA / TENCOR 5200XP For Sale](https://cdn.caeonline.com/images/kla-tencor_5200xp_1040527.jpg)
![Loading](/img/loader.gif)
Sold
ID: 9236317
Wafer Size: 6"-8"
Overlay measurement system, 6"-8"
Main system
Configuration:
Fully automated non-contact box-in-box measurement (Stepper alignment)
GEM / SECS: 5.3.26
Indexer: Port open (Type 2)
Console: VAX / XP
Blower box
Backups
Covers
Reflective host chuck
Operations manual included.
KLA / TENCOR 5200XP Wafer Testing and Metrology Equipment is designed for accurate inspection and testing of wafers for a wide range of semiconductor fabrication processes. This versatile system supports a variety of applications, ranging from 2D and 3D scanning, to mask inspection, defect tracking, and more. For 2D scanning and inspection, KLA 5200XP is equipped with a large high-resolution CCD camera and an included full-field scan head. This highly-sensitive imaging unit delivers superior sensitivity and image resolution that allows for the detection of extremely small defects. The platform supports 3D scanning using an auto-align rotary stage, allowing users to precisely scan and evaluate Wafers of different thicknesses and surface topographies. TENCOR 5200 XP also includes a high-accuracy flatness test head, which allows for wafer image stitching and automated flatness inspection. This enables the quick and efficient analysis of wafer flatness, identifying out-of-tolerance areas quickly and accurately. Additionally, the machine features an integrated laser interferometer that enables wafer edge readings for all wafer types. Moreover, 5200XP incorporates advanced KLA technology for mask inspection. This allows for the detection and tracking of defects from the mask design down to the fabricated device. High throughput, flexibility, and unparalleled accuracy make 5200 XP the ideal tool for mask inspection and defect analysis. This also helps to reduce faulty product and customer returns, ultimately improving process efficiency. Overall, KLA / TENCOR 5200 XP is designed for quick and accurate wafer testing and metrology. Its comprehensive range of imaging, 3D scanning, flatness testing and mask alignment features, combined with its easy-to-use interface, ensure that users can accurately and efficiently assess the quality of their wafers. This makes KLA 5200 XP an invaluable tool for ensuring excellent semiconductor fabrication quality.
There are no reviews yet