Used NANOMETRICS NanoSpec AFT 210 #9043965 for sale

NANOMETRICS NanoSpec AFT 210 is an automated 100X mask and wafer inspection equipment used in the semiconductor industry for detection of physical and electrical defects. The system helps detect and identify defects with the use of diffraction-based scatterometry techniques and electron-beam nanopatterning. The NanoSpec features a high-speed vision unit and a physics model-based defect detection and classification engine. This combination of features offers high accuracy and repeatability in fast scan time. The NanoSpec is also capable of measuring line widths to sub-50 nanometers (nm). In addition, the machine can discriminate between different types of defects such as lithographic, doping, plating, and etching. The NanoSpec utilizes reflective and dark-field illumination, which allows for a wide variety of inspection configurations. The tool relies on an ultra-fast imaging asset to capture information in nanoseconds and an image processing model designed for efficient pattern recognition. The equipment can detect defects as small as 110 nm, including those created through advanced lithographic techniques such as pitch-divided lines and dual-tone layouts. The system also offers automated job programming, process control, and pass/fail analysis. It is capable of high-volume simultaneous wafer and mask inspections and can be integrated with many front-end process control systems. The unit is also equipped with a laser microscope to identify and study microstructures and contamination. The NanoSpec's defect inspection accuracy is 0.2 microns for all types of defects. Additionally, the machine offers a 100 percent sampling rate which guarantees the identification of all defects present on a wafer or mask. All tool data is stored in the company's proprietary database for further analysis and process evaluation. The asset is also compatible with most major software programs for data manipulation and inspection evaluation. The NanoSpec is a cost-effective instrument that helps identify and reduce defects while optimizing the tool for process improvement. With its intuitive and easy-to-use interface, customers can quickly configure settings, select the appropriate defect detection criteria, and generate detailed inspection reports. In addition, the model's high-speed scanning reduces mask and wafer inspection time - meaning increased production throughput.