Used NANOMETRICS NanoSpec AFT 210 #9086405 for sale
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NANOMETRICS NanoSpec AFT 210 Mask & Wafer Inspection equipment from NANOMETRICS is an advanced metrology instrument designed for non-destructive inspection of critical electronic devices. The system is equipped with an ultra-high resolution imaging unit and scanning electron microscope (SEM) optics for fast, accurate imaging. It features a unique auto-focus technology that enables ultra-sharp images with superior accuracy and repeatability. This machine also offers high-speed mapping capabilities, allowing for rapid imaging, analysis, and diagnostics of a wide range of materials. The tool's automated handling asset includes an automated 8-point autofocus alignment process, a precision-controlled wafer stage, and pattern recognition software. With this model, the operator can easily specify and adjust the imaging parameters with minimal effort. The high-sensitivity AutoFocus technology ensures precise image alignment, and its scanning electron microscope optics provide supreme resolution with the utmost accuracy. NANOMETRICS NANOSPEC / AFT 210 also supports many different image and analysis capabilities, including area defect mapping and bright field/dark field analysis. The equipment allows for an array of image segmentation options to separate and display defects for analysis. Additionally, it supports snap-shot calibration and automated mask alignment. NanoSpec AFT 210 also has a powerful software package. Its software suite contains an integrated suite of measurement and analysis tools, such as statistical analysis and built-in scripts for process optimization. These tools allow for the extraction of detailed metrological information from images. It also has powerful network connection capabilities, enabling sharing of results in real time. Overall, NANOSPEC / AFT 210 is a powerful, economical, and simple to use mask and wafer inspection system. It offers an array of advanced metrology capabilities, such as automated 8-point autofocus alignment, high-sensitivity microscopy optics, and area defect mapping capabilities. It also features a robust software suite with a wide range of measurement and analysis tools. It is an ideal choice for manufacturing and metrology professionals.
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